HETG high-order diffraction efficiency

Author(s):  
Kathryn A. Flanagan ◽  
Norbert S. Schulz ◽  
Stephen S. Murray ◽  
Gisela D. Hartner ◽  
Peter Predehl
2018 ◽  
Vol 35 (4) ◽  
pp. 711 ◽  
Author(s):  
Tanchao Pu ◽  
Ziwei Liu ◽  
Lina Shi ◽  
Guanya Wang ◽  
Jiebin Niu ◽  
...  

2011 ◽  
Vol 36 (12) ◽  
pp. 2357 ◽  
Author(s):  
Bosanta R. Boruah ◽  
Gordon D. Love ◽  
Mark A. A. Neil

2007 ◽  
Vol 364-366 ◽  
pp. 719-723
Author(s):  
Quan Liu ◽  
Jian Hong Wu ◽  
Ling Ling Fang ◽  
Chao Ming Li

A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves several steps: coating of substrates with controlled thickness of photoresist, formation of a grating mask by holograph interference exposure and development, and finally transferring etching of this mask into the fused silica substrate to form a permanent phase mask. Experimental measurements have shown that the zero order diffraction efficiency is less than 4% and the plus and minus first-order diffraction efficiency is more than 35%. Theoretical analysis has shown that these phase masks can be used for fabricating UV written Fiber Bragg Gratings.


1993 ◽  
Vol 101 (1-2) ◽  
pp. 85-91 ◽  
Author(s):  
W.X. Xie ◽  
M. Douay ◽  
P. Bernage ◽  
P. Niay ◽  
J.F. Bayon ◽  
...  

1993 ◽  
Vol 02 (02) ◽  
pp. 221-227
Author(s):  
HONG-JUN ZHANG ◽  
ZE-SUN TANG ◽  
THOMAS R. MOORE ◽  
ROBERT W. BOYD

We have observed multiple-order diffraction from photorefractive gratings formed by two input beams of comparable intensity that interfere in a single crystal of SBN:Ce. High-order diffraction occurs both in the direction of two-beam coupling gain and in the opposite direction. These results are in good agreement with the predictions of a theoretical model that interprets high-order diffraction as a form of Raman-Nath scattering from a highly anharmonic diffraction grating that is formed by a light intensity distribution having a large depth of modulation.


1996 ◽  
Vol 68 (14) ◽  
pp. 1913-1914 ◽  
Author(s):  
X. Wei ◽  
X. Z. Yan ◽  
D. R. Zhu ◽  
D. Mo ◽  
Z. X. Liang ◽  
...  

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