Photoresist focus exposure matrix (FEM) measurements using critical-dimension atomic force microscopy (CD AFM)

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Sylvain Muckenhirn
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Ronald G. Dixson ◽  
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Michael T. Postek

Nano Letters ◽  
2004 ◽  
Vol 4 (7) ◽  
pp. 1301-1308 ◽  
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Qi Ye ◽  
Alan M. Cassell ◽  
Hongbing Liu ◽  
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...  

2002 ◽  
Author(s):  
Byong Chon Park ◽  
Ki Y. Jung ◽  
Won Young Song ◽  
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TaeBong Eom

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