Applications of a self-developing photopolymer material: holographic interferometry and high-efficiency diffractive optical elements

1998 ◽  
Author(s):  
Suzanne Martin ◽  
Clodagh A. Feely ◽  
John T. Sheridan ◽  
Vincent Toal
Keyword(s):  
Holographic Interferometry ◽  
High Efficiency ◽  
Diffractive Optical Elements ◽  
Optical Elements

Novel continuously shaped diffractive optical elements enable high efficiency beam shaping

2010 ◽  
Author(s):  
Yuri V. Miklyaev ◽  
Waleri Imgrunt ◽  
Vladimir S. Pavelyev ◽  
Denis G. Kachalov ◽  
Tanja Bizjak ◽  
...  
Keyword(s):  
High Efficiency ◽  
Beam Shaping ◽  
Diffractive Optical Elements ◽  
Optical Elements

Simple and universal method in designs of high-efficiency diffractive optical elements for spectrum separation and beam concentration

2017 ◽  
Vol 26 (7) ◽  
pp. 074202
Author(s):  
Wen-Qi Xu ◽  
Dong-Feng Lin ◽  
Xin Xu ◽  
Jia-Sheng Ye ◽  
Xin-Ke Wang ◽  
...  
Keyword(s):  
High Efficiency ◽  
Universal Method ◽  
Diffractive Optical Elements ◽  
Optical Elements

High quality diffractive optical elements (DOEs) using SMILE imprint technique

2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Simon Drieschner ◽  
Fabian Kloiber ◽  
Marc Hennemeyer ◽  
Jan J. Klein ◽  
Manuel W. Thesen
Keyword(s):  
Soft Lithography ◽  
High Efficiency ◽  
Low Cost ◽  
Industrial Applications ◽  
Diffractive Optical Elements ◽  
Large Area ◽  
High Quality ◽  
Optical Elements ◽  
Uv Curable ◽  
Aspect Ratios

Abstract Augmented reality (AR) enhancing the existing natural environment by overlaying a virtual world is an emerging and growing market and attracts huge commercial interest into optical devices which can be implemented into head-mounted AR equipment. Diffractive optical elements (DOEs) are considered as the most promising candidate to meet the market’s requirements such as compactness, low-cost, and reliability. Hence, they allow building alternatives to large display headsets for virtual reality (VR) by lightweight glasses. Soft lithography replication offers a pathway to the fabrication of large area DOEs with high aspect ratios, multilevel features, and critical dimensions below the diffractive optical limit down to 50 nm also in the scope of mass manufacturing. In combination with tailored UV-curable photopolymers, the fabrication time can be drastically reduced making it very appealing to industrial applications. Here, we illustrate the key features of high efficiency DOEs and how the SMILE (SUSS MicroTec Imprint Lithography Equipment) technique can be used with advanced imprint photopolymers to obtain high quality binary DOEs meeting the market’s requirements providing a very versatile tool to imprint both nano- and microstructures.

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