Wide-bandwidth silicon nitride membrane microphones

1997 ◽  
Author(s):  
Brian T. Cunningham ◽  
Jonathan J. Bernstein
Keyword(s):  
Silicon Nitride ◽  
Wide Bandwidth ◽  
Silicon Nitride Membrane

Performance and Reliability of a MEMS-based tunable optical filter operating in the 1565 nm-1525 nm wavelength range

2002 ◽  
Vol 722 ◽  
Author(s):  
T. S. Sriram ◽  
B. Strauss ◽  
S. Pappas ◽  
A. Baliga ◽  
A. Jean ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Line Width ◽  
Insertion Loss ◽  
Optical Filter ◽  
Single Mode ◽  
Single Mode Fiber ◽  
Reliability Testing ◽  
Silicon Nitride Membrane ◽  
Tunable Optical Filter ◽  
Extensive Performance

AbstractThis paper describes the results of extensive performance and reliability characterization of a silicon-based surface micro-machined tunable optical filter. The device comprises a high-finesse Fabry-Perot etalon with one flat and one curved dielectric mirror. The curved mirror is mounted on an electrostatically actuated silicon nitride membrane tethered to the substrate using silicon nitride posts. A voltage applied to the membrane allows the device to be tuned by adjusting the length of the cavity. The device is coupled optically to an input and an output single mode fiber inside a hermetic package. Extensive performance characterization (over operating temperature range) was performed on the packaged device. Parameters characterized included tuning characteristics, insertion loss, filter line-width and side mode suppression ratio. Reliability testing was performed by subjecting the MEMS structure to a very large number of actuations at an elevated temperature both inside the package and on a test board. The MEMS structure was found to be extremely robust, running trillions of actuations without failures. Package level reliability testing conforming to Telcordia standards indicated that key device parameters including insertion loss, filter line-width and tuning characteristics did not change measurably over the duration of the test.

Effect of nanopore size on poly(dT)30 translocation through silicon nitride membrane

2013 ◽  
Vol 56 (10) ◽  
pp. 2398-2402 ◽  
Author(s):  
Wei Si ◽  
JingJie Sha ◽  
Lei Liu ◽  
YingHua Qiu ◽  
YunFei Chen
Keyword(s):  
Silicon Nitride ◽  
Silicon Nitride Membrane

scholarly journals A coded aperture microscope for X-ray fluorescence full-field imaging

2020 ◽  
Vol 27 (6) ◽  
pp. 1703-1706
Author(s):  
D. P. Siddons ◽  
A. J. Kuczewski ◽  
A. K. Rumaiz ◽  
R. Tappero ◽  
M. Idir ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Near Field ◽  
Coded Aperture ◽  
Full Field ◽  
X Ray ◽  
Silicon Nitride Membrane ◽  
Coded Apertures ◽  
Redundant Arrays ◽  
Field Imaging ◽  
Good Contrast

The design and construction of an instrument for full-field imaging of the X-ray fluorescence emitted by a fully illuminated sample are presented. The aim is to produce an X-ray microscope with a few micrometers spatial resolution, which does not need to scan the sample. Since the fluorescence from a spatially inhomogeneous sample may contain many fluorescence lines, the optic which will provide the magnification of the emissions must be achromatic, i.e. its optical properties must be energy-independent. The only optics which fulfill this requirement in the X-ray regime are mirrors and pinholes. The throughput of a simple pinhole is very low, so the concept of coded apertures is an attractive extension which improves the throughput by having many pinholes, and retains the achromatic property. Modified uniformly redundant arrays (MURAs) with 10 µm openings and 50% open area have been fabricated using gold in a lithographic technique, fabricated on a 1 µm-thick silicon nitride membrane. The gold is 25 µm thick, offering good contrast up to 20 keV. The silicon nitride is transparent down into the soft X-ray region. MURAs with various orders, from 19 up to 73, as well as their respective negative (a mask where open and closed positions are inversed compared with the original mask), have been made. Having both signs of mask will reduce near-field artifacts and make it possible to correct for any lack of contrast.

scholarly journals Ground state cooling of a quantum electromechanical system with a silicon nitride membrane in a 3D loop-gap cavity

2016 ◽  
Vol 18 (10) ◽  
pp. 103036 ◽  
Author(s):  
Atsushi Noguchi ◽  
Rekishu Yamazaki ◽  
Manabu Ataka ◽  
Hiroyuki Fujita ◽  
Yutaka Tabuchi ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Ground State ◽  
Electromechanical System ◽  
Silicon Nitride Membrane ◽  
Ground State Cooling

scholarly journals Practical Guide to the Design, Fabrication, and Calibration of NIST Nanocalorimeters

2019 ◽  
Vol 124 ◽  
Author(s):  
Feng Yi ◽  
Michael D. Grapes ◽  
David A. LaVan
Keyword(s):  
Thermal Analysis ◽  
Silicon Nitride ◽  
Temperature Sensor ◽  
Small Scale ◽  
Thermal Isolation ◽  
Calibration Process ◽  
Practical Guide ◽  
Silicon Nitride Membrane

We report here on the design, fabrication, and calibration of nanocalorimeter sensors used in the National Institute of Standards and Technology (NIST) Nanocalorimetry Measurements Project. These small-scale thermal analysis instruments are produced using silicon microfabrication approaches. A single platinum line serves as both the heater and temperature sensor, and it is made from a 500 μm wide, 100 nm thick platinum trace, suspended on a 100 nm thick silicon nitride membrane for thermal isolation. Supplemental materials to this article (available online) include drawing files and LabVIEW code used in the fabrication and calibration process.

Interferometer Type Pressure Microsensor

2005 ◽  
Vol 888 ◽  
Author(s):  
A. Heredia-J ◽  
Alonso Ramirez-Pichon ◽  
J. Sánchez Mondragón ◽  
A. Andrade Lucio ◽  
M. Basurto Pensado ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
High Sensitivity ◽  
Maximum Pressure ◽  
Silicon Membrane ◽  
Maximum Deformation ◽  
Silicon Nitride Membrane ◽  
Type Pressure

AbstractIn this work, the fabrication of waveguide and nitride silicon membrane is presented. The measurement configuration chosen to detect the variation produced in the light properties is an Interferometer configuration of the Mach Zehnder Type (MZI), because of its high sensitivity. One of its arms is positioned on a floating silicon nitride membrane that becomes deformed under small pressures on the range of MPa. According to the parameters of the membrane and the waveguide we obtain a maximum deformation of 176 nm that produces a change of phase of 180° between the two waves, producing therein a null interferometer output for the maximum pressure.The analyses of theory suggest that this device will be able to sense a pressure value up to 13.376MPa.

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