Computer-enhanced photon tunneling microscopy for surface characterization of optical materials

1997 ◽  
Author(s):  
James D. Kleinmeyer ◽  
J. Derek Demaree
2012 ◽  
Vol 1517 ◽  
Author(s):  
Chad D. Yuen ◽  
Gordon J. Miller ◽  
Patricia A. Thiel

AbstractBased on X-ray photoelectron spectroscopy, Gd5Ge4(010) does not show evidence of surface segregation. Scanning tunneling microscopy reveals two types of terraces which alternate laterally on the surface. From the step heights, these two surface terminations are assigned as dense, Gd-pure layers in the bulk structure. There is evidence of reconstruction on one type of terrace.


1992 ◽  
Vol 00 (6) ◽  
pp. 8-8 ◽  
Author(s):  
John M. Guerra

The Photon Tunneling Microscope is used to provide high resolution (subnanometer vertical), quantifiable, real-time, 3-D (with continuously variable viewpoint) imaging and profilometry of homogenous dielectric samples, whether transparent or absorbing. A partial list of these includes: thin films (micraroughness. damage evaluation, step height) optical storage media (pit depth and shape measurement), magnetic media (microroughness, wear tracks), polymers (surface characterization), optical surfaces (microroughness, damage, polishing evaluation), diamond-turned optical surfaces (tool and machine characteristics from surface topography), binary optic surfaces, porous silicon structure, photographic grain analysis, replicas of metal surfaces, microlithography evaluation, and manufacturing web evaluation (film base, magnetic media base).


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