High-resolution microlithography using a 193-nm excimer laser source

1997 ◽  
Author(s):  
Nadeem H. Rizvi ◽  
Dominic Ashworth ◽  
Malcolm C. Gower
Keyword(s):  
High Resolution ◽  
Excimer Laser ◽  
Laser Source ◽  
193 Nm

High Resolution Displacement of Functional Groups onto Fluorocarbon Resin Surface by Using ArF Excimer Laser

1996 ◽  
Vol 451 ◽  
Author(s):  
T. Shimizu ◽  
M. Murahara
Keyword(s):  
Contact Angle ◽  
High Resolution ◽  
Laser Beam ◽  
Thin Layer ◽  
Functional Groups ◽  
Excimer Laser ◽  
Laser Fluence ◽  
Large Area ◽  
Three Solutions ◽  
Arf Excimer Laser

ABSTRACTA Fluorocarbon resin surface was selectively modified by irradiation with a ArF laser beam through a thin layer of NaAlO2, B(OH)3, or H2O solution to give a hydrophilic property. As a result, with low fluence, the surface was most effectively modified with the NaAlO2 solution among the three solutions. However, the contact angle in this case changed by 10 degrees as the fluence changed only 1mJ/cm2. When modifying a large area of the surface, high resolution displacement could not be achieved because the laser beam was not uniform in displacing functional groups. Thus, the laser fluence was successfully made uniform by homogenizing the laser beam; the functional groups were replaced on the fluorocarbon resin surface with high resolution, which was successfully modified to be hydrophilic by distributing the laser fluence uniformly.

Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser

1988 ◽  
Vol 45 (4) ◽  
pp. 361-364 ◽  
Author(s):  
F. Foulon ◽  
E. Fogarassy ◽  
A. Slaoui ◽  
C. Fuchs ◽  
S. Unamuno ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Melting Threshold ◽  
193 Nm

Excimer Laser (193 nm) Myopic Keratomileusis in Sighted and Blind Human Eyes

1990 ◽  
Vol 6 (3) ◽  
pp. 165-173 ◽  
Author(s):  
Theo Seiler ◽  
Gunter Kahle ◽  
Martin Kriegerowski
Keyword(s):  
Excimer Laser ◽  
193 Nm ◽  
Human Eyes

CW emission at 193 nm using an all solid-state laser source

2014 ◽  
Author(s):  
Matthias Scholz ◽  
Dmitrijs Opalevs ◽  
Jürgen Stuhler ◽  
Patrick Leisching ◽  
Wilhelm Kaenders ◽  
...  
Keyword(s):  
Solid State ◽  
Solid State Laser ◽  
Laser Source ◽  
State Laser ◽  
193 Nm

scholarly journals 193-nm deep-UV lithography system using a line-narrowed ArF excimer laser

1993 ◽  
Author(s):  
Bruce W. Smith ◽  
Malcolm C. Gower ◽  
Mark Westcott ◽  
Lynn F. Fuller
Keyword(s):  
Excimer Laser ◽  
Uv Lithography ◽  
Arf Excimer Laser ◽  
Deep Uv ◽  
193 Nm ◽  
Lithography System
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