Ablation threshold behavior of femtosecond laser twin double-pulse processing of solids

2020 ◽  
Author(s):  
Kaihu Zhang ◽  
JiaBo Zhang ◽  
Ning Zhang ◽  
Xiaohui Zhang ◽  
Liyan Zheng ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Ablation Threshold ◽  
Double Pulse ◽  
Threshold Behavior ◽  
Pulse Processing

scholarly journals Improvement of Etching Anisotropy in Fused Silica by Double-Pulse Fabrication

Micromachines ◽  
2020 ◽  
Vol 11 (5) ◽  
pp. 483
Author(s):  
Valdemar Stankevič ◽  
Jonas Karosas ◽  
Gediminas Račiukaitis ◽  
Paulius Gečys
Keyword(s):  
Femtosecond Laser ◽  
Processing Speed ◽  
Laser Pulses ◽  
Processing Parameters ◽  
Fused Silica ◽  
Double Pulse ◽  
Pulse Delay ◽  
Pulse Processing ◽  
Wide Range ◽  
Significant Process

Femtosecond laser-induced selective etching (FLISE) is a promising technology for fabrication of a wide range of optical, mechanical and microfluidic devices. Various etching conditions, together with significant process optimisations, have already been demonstrated. However, the FLISE technology still faces severe limitations for a wide range of applications due to limited processing speed and polarization-dependent etching. In this article, we report our novel results on the double-pulse processing approach on the improvement of chemical etching anisotropy and >30% faster processing speed in fused silica. The effects of pulse delay and pulse duration were investigated for further understanding of the relations between nanograting formation and etching. The internal sub-surface modifications were recorded with double cross-polarised pulses of a femtosecond laser, and a new nanograting morphology (grid-like) was demonstrated by precisely adjusting the processing parameters in a narrow processing window. It was suggested that this grid-like morphology impacts the etching anisotropy, which could be improved by varying the delay between two orthogonally polarized laser pulses.

Chromium thin film ablation with double pulse of femtosecond laser

2004 ◽  
Author(s):  
Etsuji Ohmura ◽  
Tomohiro Okamoto ◽  
Seiji Fujiwara ◽  
Tomokazu Sano ◽  
Isamu Miyamoto
Keyword(s):  
Thin Film ◽  
Femtosecond Laser ◽  
Double Pulse

Double-pulse femtosecond laser peening of aluminum alloy AA5038: Effect of inter-pulse delay on transient optical plume emission and final surface micro-hardness

2016 ◽  
Vol 109 (21) ◽  
pp. 211902 ◽  
Author(s):  
E. I. Ageev ◽  
V. Yu. Bychenkov ◽  
A. A. Ionin ◽  
S. I. Kudryashov ◽  
A. A. Petrov ◽  
...  
Keyword(s):  
Aluminum Alloy ◽  
Femtosecond Laser ◽  
Double Pulse ◽  
Laser Peening ◽  
Micro Hardness ◽  
Pulse Delay ◽  
Final Surface ◽  
Plume Emission

Femtosecond laser corneal ablation threshold: Dependence on tissue depth and laser pulse width

2007 ◽  
Vol 39 (8) ◽  
pp. 654-658 ◽  
Author(s):  
Hui Sun ◽  
Meng Han ◽  
Markolf H. Niemz ◽  
Josef F. Bille
Keyword(s):  
Laser Pulse ◽  
Femtosecond Laser ◽  
Pulse Width ◽  
Ablation Threshold ◽  
Laser Pulse Width

Modulation and mechanism of shockwaves induced on metals by femtosecond laser double-pulse

2020 ◽  
Vol 53 (16) ◽  
pp. 165104
Author(s):  
Guoyan Wang ◽  
Jingya Sun ◽  
Pengfei Ji ◽  
Jie Hu ◽  
Jiaxin Sun ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Double Pulse

A model to predict the ablation width and calculate the ablation threshold of femtosecond laser

2018 ◽  
Vol 456 ◽  
pp. 482-486 ◽  
Author(s):  
Jianchao Liang ◽  
Weidong Liu ◽  
Yao Li ◽  
Zhen Luo ◽  
Dongqing Pang
Keyword(s):  
Femtosecond Laser ◽  
Ablation Threshold

Uniform LIPSS on titanium irradiated by two-color double-pulse beam of femtosecond laser

2020 ◽  
Vol 32 (2) ◽  
pp. 022054
Author(s):  
Masaki Hashida ◽  
Yuki Furukawa ◽  
Shunsuke Inoue ◽  
Shuji Sakabe ◽  
Shinichiro Masuno ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Double Pulse ◽  
Pulse Beam
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