Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes

2021 ◽  
Author(s):  
Kazuki Azumagawa ◽  
Takahiro Kozawa
Keyword(s):  
Regression Analysis ◽  
Extreme Ultraviolet ◽  
Chemical Gradient ◽  
Concentration Effects ◽  
Chemically Amplified ◽  
Quencher Concentration

Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists

2021 ◽  
Author(s):  
Takahiro KOZAWA
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Line Edge Roughness ◽  
Chemical Gradient ◽  
Trade Off ◽  
Chemically Amplified ◽  
Optical Images ◽  
Euv Lithography ◽  
Edge Roughness ◽  
The Relationship

Abstract The manufacturing of semiconductor devices using extreme ultraviolet (EUV) lithography started in 2019. A high numerical aperture (NA) tool under development is capable of resolving 8 nm line-and-space optical images and will extend the application of EUV lithography. However, resist materials have not been yet applicable to the production with 8 nm resolution. In this study, the relationships among the half-pitch of line-and-space patterns (resolution), chemical gradient [an indicator of line edge roughness (LER)], and sensitivity were investigated in the sub-10 nm half-pitch region for chemically amplified EUV resists. The chemical gradient was simulated on the basis of their sensitization and reaction mechanisms. The relationship was formulated as a function of total sensitizer concentration (the sum of photoacid generator and photodecomposable quencher concentrations) and the thermalization distance of secondary electrons. The effect of thermalized electrons was well incorporated into the trade-off relationships between resolution, LER, and sensitivity.

Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists

2009 ◽  
Vol 48 (12) ◽  
pp. 126004 ◽  
Author(s):  
Takahiro Kozawa ◽  
Hiroaki Oizumi ◽  
Toshiro Itani ◽  
Seiichi Tagawa
Keyword(s):  
Extreme Ultraviolet ◽  
Chemical Gradient ◽  
Chemically Amplified ◽  
Gradient Enhancement
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