Innovative dual mark design for alignment verification and process monitoring in advanced lithography

Author(s):  
Jia Hung Chang ◽  
En Chuan Lio ◽  
Junjin Lin ◽  
Tang Chun Weng ◽  
Bill Lin ◽  
...  
Keyword(s):  
Author(s):  
Anand Tharanathan ◽  
Jason Laberge ◽  
Peter Bullemer ◽  
Dal Vernon Reising ◽  
Rich McLain

1998 ◽  
Vol 49 (9) ◽  
pp. 976-985
Author(s):  
M Wood ◽  
N Capon ◽  
and M Kaye

2010 ◽  
Vol 130 (11) ◽  
pp. 1987-1993
Author(s):  
Makoto Ono ◽  
Hirohito Hayashi ◽  
Akira Kondo ◽  
Daisuke Hamaguchi ◽  
Shun'ichi Kaneko

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