Development of UV to IR band nanostructured antireflection coating technology for improved detector performance

Infrared Sensors, Devices, and Applications X ◽

10.1117/12.2571233 ◽

2020 ◽

Author(s):

Ashok K. Sood ◽

John W. Zeller ◽

Gopal G. Pethuraja ◽

Adam W. Sood ◽

Roger E. Welser ◽

...

Keyword(s):

Antireflection Coating ◽

Detector Performance ◽

Coating Technology

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Development of nanostructured antireflection coating technology for IR band for improved detector performance

10.1117/12.2598994 ◽

2021 ◽

Author(s):

Ashok K. Sood ◽

John W. Zeller ◽

Adam W. Sood ◽

Roger E. Welser ◽

Parminder Ghuman ◽

...

Keyword(s):

Antireflection Coating ◽

Detector Performance ◽

Coating Technology

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Porous SiO2 films prepared by remote plasma-enhanced chemical vapour deposition – a novel antireflection coating technology for photovoltaic modules

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(00)00079-9 ◽

2001 ◽

Vol 65 (1-4) ◽

pp. 71-77 ◽

Cited By ~ 46

Author(s):

H Nagel ◽

A Metz ◽

R Hezel

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Antireflection Coating ◽

Remote Plasma ◽

Coating Technology ◽

Sio2 Films ◽

Photovoltaic Modules ◽

Porous Sio2

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Development of UV to IR band nanostructured antireflection coating technology for improved detector and sensor performance

Image Sensing Technologies: Materials, Devices, Systems, and Applications VIII ◽

10.1117/12.2591158 ◽

2021 ◽

Author(s):

Ashok K. Sood ◽

Dr. John W. Zeller ◽

Adam W. Sood ◽

Roger E. Welser ◽

Harry Efstathiadis ◽

...

Keyword(s):

Antireflection Coating ◽

Coating Technology ◽

Sensor Performance

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Development of UV to IR band nanostructured antireflection coating technology for improved detector and sensor performance

Infrared Sensors, Devices, and Applications XI ◽

10.1117/12.2598993 ◽

2021 ◽

Author(s):

Ashok K. Sood

Keyword(s):

Antireflection Coating ◽

Coating Technology ◽

Sensor Performance

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Development of UV to IR band nanostructured antireflection coating technology for improved detector and sensor performance

Sensors, Systems, and Next-Generation Satellites XXIV ◽

10.1117/12.2571713 ◽

2020 ◽

Author(s):

Ashok K. Sood ◽

John W. Zeller ◽

Gopal G. Pethuraja ◽

Adam W. Sood ◽

Roger E. Welser ◽

...

Keyword(s):

Antireflection Coating ◽

Coating Technology ◽

Sensor Performance

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High-purity Ge x-ray detectors: Sensitivity factors and usefulness

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100136350 ◽

1990 ◽

Vol 48 (2) ◽

pp. 548-548

Author(s):

E. B. Steel

Keyword(s):

High Purity ◽

High Energy ◽

Quantitative Chemical Analysis ◽

Detector Performance ◽

X Ray ◽

Detector Sensitivity ◽

Specimen Holder ◽

Many Instruments ◽

Charge Resolution ◽

Sensitivity Factors

High Purity Germanium (HPGe) x-ray detectors are now commercially available for the analytical electron microscope (AEM). The detectors have superior efficiency at high x-ray energies and superior resolution compared to traditional lithium-drifted silicon [Si(Li)] detectors. However, just as for the Si(Li), the use of the HPGe detectors requires the determination of sensitivity factors for the quantitative chemical analysis of specimens in the AEM. Detector performance, including incomplete charge, resolution, and durability has been compared to a first generation detector. Sensitivity factors for many elements with atomic numbers 10 through 92 have been determined at 100, 200, and 300 keV. This data is compared to Si(Li) detector sensitivity factors.The overall sensitivity and utility of high energy K-lines are reviewed and discussed. Many instruments have one or more high energy K-line backgrounds that will affect specific analytes. One detector-instrument-specimen holder combination had a consistent Pb K-line background while another had a W K-line background.

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