scholarly journals Antireflective moth-eye structures on curved surfaces fabricated by nanoimprint lithography (Erratum)

2020 ◽  
Author(s):  
Michael J. Haslinger ◽  
Amiya R. Moharana ◽  
Michael Mühlberger
Keyword(s):  
Nanoimprint Lithography ◽  
Curved Surfaces

Nanopatterning highly curved surfaces using hybrid nanoimprint lithography

SPIE Newsroom ◽  
2013 ◽  
Author(s):  
Haixiong Ge ◽  
Wei Wu ◽  
Zhiwei Li ◽  
Jizong Zhang ◽  
Yiming Shen ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Curved Surfaces

scholarly journals Development of Micropatterns on Curved Surfaces Using Two-Step Ultrasonic Forming

Micromachines ◽  
2019 ◽  
Vol 10 (10) ◽  
pp. 654
Author(s):  
Jong-Han Park ◽  
Keun Park
Keyword(s):  
Nanoimprint Lithography ◽  
Mold Insert ◽  
Curved Surfaces ◽  
Thermoplastic Polymer ◽  
Nanoscale Patterning ◽  
Flexible Polymer ◽  
Soft Mold ◽  
Nanoscale Patterns ◽  
Stretching Process ◽  
Ultrasonic Imprinting

Nanoimprint lithography (NIL) is a micro/nanoscale patterning technology on thermoplastic polymer films, and has been widely used to fabricate functional micro/nanoscale patterns. NIL was also used to develop micro/nanoscale patterns on curved surfaces by employing flexible polymer stamps or micropatterned metal molds with macroscopic curvatures. In this study, two-step ultrasonic forming was used to develop micropatterns on a curved surface out of a flat metal stamp, by connecting ultrasonic imprinting and stretching processes. Ultrasonic imprinting was used to replicate functional micropatterns on a flat polymer film, using a flat ultrasonic horn and micropatterned metal stamps with prism and dot micropatterns. An ultrasonic stretching process was then used to form a curvature on the patterned film using a curved ultrasonic horn and a soft mold insert, to avoid damage to the pre-developed micropatterns. The ultrasonic horn was designed to have three different tip radii, and the resulting forming depth and curvature formation were investigated experimentally. As a result, three different curved surfaces containing two different micropatterns were obtained. The developed curved films containing micropatterns were then evaluated optically, and showed different optical diffusion and illumination characteristics according to the film curvature and micropattern type. These results indicate that the proposed technology can extend the functionality of conventional micropatterned products by imposing appropriate curvatures.

An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV-Nanoimprint Lithography

2014 ◽  
Vol 35 (19) ◽  
pp. 1712-1718 ◽  
Author(s):  
Xin Hu ◽  
Shisong Huang ◽  
Ronghua Gu ◽  
Changsheng Yuan ◽  
Haixiong Ge ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Curved Surfaces

Materials purity, growth, and patterning

2020 ◽  
pp. 295-366
Author(s):  
Stephen R. Forrest
Keyword(s):  
Thin Films ◽  
Organic Semiconductors ◽  
Nanoimprint Lithography ◽  
Electronic Materials ◽  
Manufacturing Processes ◽  
Curved Surfaces ◽  
Bulk Crystal Growth ◽  
Roll To Roll ◽  
Device Structures

This chapter describes the purification and growth of organic materials, device patterning, and coating of large substrate areas using volume manufacturing processes. Organic semiconductors are no different from other electronic materials—purity is of the utmost importance. The chapter begins by describing several purification techniques for achieving and assessing the quality of electronic-grade materials. Next is a discussion of bulk crystal growth, and growth by more technologically important methods for achieving thin films using solution or vapor phase growth processes. Post-growth annealing for achieving desired film morphologies is also discussed. Patterning of device structures by photolithography, stamping and nanoimprint lithography on both planar and curved surfaces are described. This is followed by consideration of manufacturing processes such as roll-to-roll production, and the constraints that such processes place on the choice of substrate. Last, packaging and device encapsulation that maintain substrate flexibility while protecting devices from attack by adverse environments is discussed.

scholarly journals Development and Implementation of a Rotating Nanoimprint Lithography Tool for Orthogonal Imprinting on Edges of Curved Surfaces

2021 ◽  
Author(s):  
Shraddha Supreeti ◽  
Ralf Schienbein ◽  
Patrick Feßer ◽  
Florian Fern ◽  
Martin Hoffmann ◽  
...  
Keyword(s):  
High Resolution ◽  
Nanoimprint Lithography ◽  
Laser Scanning ◽  
Laser Scanning Microscopy ◽  
Confocal Laser ◽  
Curved Surfaces ◽  
White Light Interferometry ◽  
Convex Lens ◽  
Sem Imaging ◽  
Conformal Contact

AbstractUniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect of nanoimprint lithography (NIL). This study describes the development of a NIL tool and its integration into a nanopositioning and nanomeasuring machine to achieve high-precision orthogonal molding and demolding for soft ultraviolet-assisted NIL (soft UV-NIL). The process was implemented primarily on the edges of highly curved plano-convex substrates to demonstrate structure uniformity on the edges. High-resolution nanostructures of sub-200-nm lateral dimension and microstructures in the range of tens of microns were imprinted. However, the nanostructures on the edges of the large, curved substrates were difficult to characterize precisely. Therefore, microstructures were used to measure the structure fidelity and were characterized using profilometry, white light interferometry, and confocal laser scanning microscopy. Regardless of the restricted imaging capabilities at high inclinations for high-resolution nanostructures, the scanning electron microscope (SEM) imaging of the structures on top of the lens substrate and at an inclination of 45° was performed. The micro and nanostructures were successfully imprinted on the edges of the plano-convex lens at angles of 45°, 60°,and 90° from the center of rotation of the rotating NIL tool. The method enables precise imprinting at high inclinations, thereby presenting a different approach to soft UV-NIL on curved surfaces.

Nanoimprint Lithography on curved surfaces prepared by fused deposition modelling

2015 ◽  
Vol 3 (2) ◽  
pp. 024003 ◽  
Author(s):  
Thomas Köpplmayr ◽  
Lukas Häusler ◽  
Iris Bergmair ◽  
Michael Mühlberger
Keyword(s):  
Nanoimprint Lithography ◽  
Fused Deposition Modelling ◽  
Curved Surfaces ◽  
Fused Deposition

Flexible Sensors for NDI of Curved Surfaces on Turbofan Components

2018 ◽  
Author(s):  
Evan Weststrate ◽  
◽  
Michael S. Squillante ◽  
Sergey Chekanov
Keyword(s):  
Curved Surfaces ◽  
Flexible Sensors
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