Recent advancements of III-N materials in probe scanning lithography and metrology (Conference Presentation)

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020 ◽

10.1117/12.2555095 ◽

2020 ◽

Author(s):

Tito L. Busani ◽

Ivo Rangelow

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