Massive metrology of 2D logic patterns on BEOL EUVL

Metrology, Inspection, and Process Control for Microlithography XXXIV ◽

10.1117/12.2554543 ◽

2020 ◽

Author(s):

Sayantan Das ◽

Seul-Ki Kang ◽

Sandip Halder ◽

Kotaro Maruyama ◽

Philippe Leray ◽

...

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