Modeling photon, electron, and chemical interactions in a model hafnium oxide nanocluster EUV photoresist

2020 ◽  
Author(s):  
Patrick Theofanis ◽  
James M. Blackwell ◽  
Marie E. Krysak ◽  
Florian Gstrein
Keyword(s):  
Hafnium Oxide ◽  
Chemical Interactions

TLC detection of chemical interactions of vitamins A and D with drugs

2006 ◽  
Vol 19 (107) ◽  
pp. 27-31 ◽  
Author(s):  
Alan Ramić ◽  
Marica Medić-Šarić ◽  
Srećko Turina ◽  
Ivona Jasprica
Keyword(s):  
Chemical Interactions

Scalability of MOCVD-deposited Hafnium Oxide

2003 ◽  
Vol 765 ◽  
Author(s):  
S. Van Elshocht ◽  
R. Carter ◽  
M. Caymax ◽  
M. Claes ◽  
T. Conard ◽  
...  
Keyword(s):  
Hafnium Oxide ◽  
Interfacial Layer ◽  
Gate Dielectric ◽  
Deposition Process ◽  
Oxide Thickness ◽  
Process Conditions ◽  
Primary Concern ◽  
Gate Electrode ◽  
K Value ◽  
High K

AbstractBecause of aggressive downscaling to increase transistor performance, the physical thickness of the SiO2 gate dielectric is rapidly approaching the limit where it will only consist of a few atomic layers. As a consequence, this will result in very high leakage currents due to direct tunneling. To allow further scaling, materials with a k-value higher than SiO2 (“high-k materials”) are explored, such that the thickness of the dielectric can be increased without degrading performance.Based on our experimental results, we discuss the potential of MOCVD-deposited HfO2 to scale to (sub)-1-nm EOTs (Equivalent Oxide Thickness). A primary concern is the interfacial layer that is formed between the Si and the HfO2, during the MOCVD deposition process, for both H-passivated and SiO2-like starting surfaces. This interfacial layer will, because of its lower k-value, significantly contribute to the EOT and reduce the benefit of the high-k material. In addition, we have experienced serious issues integrating HfO2 with a polySi gate electrode at the top interface depending on the process conditions of polySi deposition and activation anneal used. Furthermore, we have determined, based on a thickness series, the k-value for HfO2 deposited at various temperatures and found that the k-value of the HfO2 depends upon the gate electrode deposited on top (polySi or TiN).Based on our observations, the combination of MOCVD HfO2 with a polySi gate electrode will not be able to scale below the 1-nm EOT marker. The use of a metal gate however, does show promise to scale down to very low EOT values.

On physico-chemical interactions between daunomycin and nucleic acids

1965 ◽  
Vol 103 (1) ◽  
pp. 25-49 ◽  
Author(s):  
E. Calendi ◽  
A. Di Marco ◽  
M. Reggiani ◽  
B. Scarpinato ◽  
L. Valentini
Keyword(s):  
Nucleic Acids ◽  
Chemical Interactions ◽  
Physico Chemical

Wide range modulation of synaptic weight in thin-film transistors with hafnium oxide gate insulator and indium-zinc oxide channel layer for artificial synapse application

Nanoscale ◽  
2021 ◽  
Author(s):  
Keonwon Beom ◽  
Jimin Han ◽  
Hyun-Mi Kim ◽  
Tae-Sik Yoon
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Thin Film Transistors ◽  
Hafnium Oxide ◽  
Synaptic Weight ◽  
Drain Current ◽  
Gate Insulator ◽  
Channel Layer ◽  
Indium Zinc Oxide ◽  
Wide Range

Wide range synaptic weight modulation with a tunable drain current was demonstrated in thin-film transistors (TFTs) with a hafnium oxide (HfO2−x) gate insulator and an indium-zinc oxide (IZO) channel layer...

Impact of chemistry on the preparation and post-modification of multilayered hollow microcapsules

2021 ◽  
Author(s):  
Angana Borbora ◽  
Uttam Manna
Keyword(s):  
Chemical Interactions ◽  
Chemical Modifications ◽  
Post Modification

Different chemical interactions/bonding allowed LbL deposition of selected constituents, and further post-chemical modifications of chemically reactive multilayered microcapsules allowed to associate desired chemical functionalities.

scholarly journals 2D-3D integration of hexagonal boron nitride and a high-κ dielectric for ultrafast graphene-based electro-absorption modulators

2021 ◽  
Vol 12 (1) ◽  
Author(s):  
Hitesh Agarwal ◽  
Bernat Terrés ◽  
Lorenzo Orsini ◽  
Alberto Montanaro ◽  
Vito Sorianello ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Hafnium Oxide ◽  
High Speed ◽  
Hexagonal Boron Nitride ◽  
Temperature Stability ◽  
Cost Effective ◽  
Fold Increase ◽  
Building Blocks ◽  
High Quality ◽  
New Device

AbstractElectro-absorption (EA) waveguide-coupled modulators are essential building blocks for on-chip optical communications. Compared to state-of-the-art silicon (Si) devices, graphene-based EA modulators promise smaller footprints, larger temperature stability, cost-effective integration and high speeds. However, combining high speed and large modulation efficiencies in a single graphene-based device has remained elusive so far. In this work, we overcome this fundamental trade-off by demonstrating the 2D-3D dielectric integration in a high-quality encapsulated graphene device. We integrated hafnium oxide (HfO2) and two-dimensional hexagonal boron nitride (hBN) within the insulating section of a double-layer (DL) graphene EA modulator. This combination of materials allows for a high-quality modulator device with high performances: a ~39 GHz bandwidth (BW) with a three-fold increase in modulation efficiency compared to previously reported high-speed modulators. This 2D-3D dielectric integration paves the way to a plethora of electronic and opto-electronic devices with enhanced performance and stability, while expanding the freedom for new device designs.

scholarly journals Dynamics of DNA Clogging in Hafnium Oxide Nanopores

2020 ◽  
Vol 124 (51) ◽  
pp. 11573-11583
Author(s):  
Shiyu Li ◽  
Shuangshuang Zeng ◽  
Chenyu Wen ◽  
Laurent Barbe ◽  
Maria Tenje ◽  
...  
Keyword(s):  
Hafnium Oxide

scholarly journals Enhanced pyroelectric response at morphotropic and field-induced phase transitions in ferroelectric hafnium oxide thin films

APL Materials ◽  
2021 ◽  
Vol 9 (5) ◽  
pp. 051120
Author(s):  
Clemens Mart ◽  
Thomas Kämpfe ◽  
Kati Kühnel ◽  
Malte Czernohorsky ◽  
Sabine Kolodinski ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Transitions ◽  
Hafnium Oxide ◽  
Oxide Thin Films ◽  
Pyroelectric Response
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