Ruthenium direct etch scatterometry solution for self-aligning semi-damascene

Metrology, Inspection, and Process Control for Microlithography XXXIV ◽

10.1117/12.2550366 ◽

2020 ◽

Author(s):

Sara Paolillo ◽

Alain Moussa ◽

Gayle Murdoch ◽

Frederic Lazzarino ◽

Anne-Laure Charley ◽

...

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