Mitigation of laser induced damage on dielectric mirrors in a robust way

2019 ◽  
Author(s):  
Li Zhou ◽  
Youen Jiang ◽  
Simin Zhang ◽  
Wei Hui ◽  
Wei Fan ◽  
...  
Keyword(s):  
Dielectric Mirrors ◽  
Laser Induced Damage

Impact of organic contamination on 1064-nm laser-induced damage threshold of dielectric mirrors

2006 ◽  
Author(s):  
A. Pereira ◽  
J.-G. Coutard ◽  
S. Becker ◽  
I. Tovena ◽  
P. Bouchut ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Organic Contamination ◽  
Dielectric Mirrors ◽  
Laser Induced Damage

Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors

2003 ◽  
Vol 210 (3-4) ◽  
pp. 353-358 ◽  
Author(s):  
Yuanan Zhao ◽  
Yingjian Wang ◽  
Hui Gong ◽  
Jianda Shao ◽  
Zhengxiu Fan
Keyword(s):  
Damage Threshold ◽  
Dielectric Mirrors ◽  
Annealing Effects ◽  
Laser Induced Damage

scholarly journals Robust optimization of the laser induced damage threshold of dielectric mirrors for high power lasers

2018 ◽  
Vol 26 (9) ◽  
pp. 11764 ◽  
Author(s):  
Marine Chorel ◽  
Thomas Lanternier ◽  
Éric Lavastre ◽  
Nicolas Bonod ◽  
Bruno Bousquet ◽  
...  
Keyword(s):  
Robust Optimization ◽  
High Power ◽  
Damage Threshold ◽  
High Power Lasers ◽  
Dielectric Mirrors ◽  
Laser Induced Damage

Investigation of the laser induced damage thresholds of all-dielectric and metal-dielectric mirrors for a continuous wave at 10.6 μm

2021 ◽  
Vol 114 ◽  
pp. 110936
Author(s):  
Zahra Nasiri ◽  
Hamidreza Fallah ◽  
Morteza Hajimahmoodzadeh ◽  
Mehdi Mardiha
Keyword(s):  
Continuous Wave ◽  
Dielectric Mirrors ◽  
Laser Induced Damage

UHV-TEM studies of laser-induced damage

1991 ◽  
Vol 49 ◽  
pp. 632-633
Author(s):  
T.S. Savage ◽  
R. Ai ◽  
D. Dunn ◽  
L.D. Marks
Keyword(s):  
Surface Science ◽  
Rapid Heating ◽  
Local Heating ◽  
Routine Practice ◽  
Transmission Electron ◽  
Northwestern University ◽  
Laser Induced Damage ◽  
Set Up ◽  
Focusing Lens ◽  
Diffusion Of Impurities

The use of lasers for surface annealing, heating and/or damage has become a routine practice in the study of materials. Lasers have been closely looked at as an annealing technique for silicon and other semiconductors. They allow for local heating from a beam which can be focused and tuned to different wavelengths for specific tasks. Pulsed dye lasers allow for short, quick bursts which can allow the sample to be rapidly heated and quenched. This short, rapid heating period may be important for cases where diffusion of impurities or dopants may not be desirable.At Northwestern University, a Candela SLL - 250 pulsed dye laser, with a maximum power of 1 Joule/pulse over 350 - 400 nanoseconds, has been set up in conjunction with a Hitachi UHV-H9000 transmission electron microscope. The laser beam is introduced into the surface science chamber through a series of mirrors, a focusing lens and a six inch quartz window.

Sign in / Sign up

Export Citation Format

Share Document