Influence of deposition temperature and precursor pulse time on properties of SiO2, HfO2 monolayers deposited by PEALD

2019 ◽  
Author(s):  
Chaoyi Yin ◽  
Meiping Zhu ◽  
Chen Song ◽  
Tingting Zeng ◽  
Nuo Xu ◽  
...  
Keyword(s):  
Deposition Temperature ◽  
Pulse Time

Atomic Layer Deposited Al2O3 Barrier Layers on Flexible PET Substrates

2013 ◽  
Vol 479-480 ◽  
pp. 80-85
Author(s):  
Rwei Ching Chang ◽  
Hsi Ting Hou ◽  
Fa Ta Tsai ◽  
Pei Sin Jhu
Keyword(s):  
Deposition Temperature ◽  
High Performance ◽  
Transmission Rate ◽  
Atomic Layer ◽  
Optical Transmittance ◽  
Pulse Time ◽  
Film Properties ◽  
Barrier Films ◽  
Layer Deposition ◽  
Deposited Films

Atomic layer deposition (ALD) is utilized to grow high performance aluminum oxide (Al2O3) barrier films on flexible PET substrates, where the effects of precursor pulse time and deposition temperature on the film properties are also studied in this work. Significant differences are observed that the water vapor transmission rate of the PET substrate is largely improved by coating the Al2O3 barrier films. Further observations on the surface roughness, optical transmittance, adhesion, mechanical properties of the deposited films are also conducted. The results show that the Al2O3 film deposited with 10 msec precursor pulse time and 60°C deposition temperature behaves the best performance.

Effect of SiC-Cu Electrode on Material Removal Rate, Tool Wear and Surface Roughness in EDM Process

2020 ◽  
Vol 38 (9A) ◽  
pp. 1406-1413
Author(s):  
Yousif Q. Laibia ◽  
Saad K. Shather
Keyword(s):  
Surface Roughness ◽  
Tool Wear ◽  
Material Removal Rate ◽  
Material Removal ◽  
Electrical Discharge Machining ◽  
Removal Rate ◽  
304 Stainless Steel ◽  
Tool Electrode ◽  
Pulse Time ◽  
Edm Process

Electrical discharge machining (EDM) is one of the most common non-traditional processes for the manufacture of high precision parts and complex shapes. The EDM process depends on the heat energy between the work material and the tool electrode. This study focused on the material removal rate (MRR), the surface roughness, and tool wear in a 304 stainless steel EDM. The composite electrode consisted of copper (Cu) and silicon carbide (SiC). The current effects imposed on the working material, as well as the pulses that change over time during the experiment. When the current used is (8, 5, 3, 2, 1.5) A, the pulse time used is (12, 25) μs and the size of the space used is (1) mm. Optimum surface roughness under a current of 1.5 A and the pulse time of 25 μs with a maximum MRR of 8 A and the pulse duration of 25 μs.

scholarly journals Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1269
Author(s):  
Chin-Chiuan Kuo ◽  
Chun-Hui Lin ◽  
Jing-Tang Chang ◽  
Yu-Tse Lin
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
High Power ◽  
Deposition Temperature ◽  
Average Power ◽  
Carbon Films ◽  
Strengthening Effect ◽  
Substrate Bias ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering at different mixture ratios of ethyne and argon atmosphere, and different substrate bias voltages and deposition temperature, with the same pulse frequency, duty cycle, and average power. The microstructure and mechanical properties of the obtained films were compared. The films consist of amorphous or nanocrystalline chromium carbide, hydrogenated amorphous carbon, and minor α-chromium phase. Decreasing the fraction of ethyne increases the content of the α-chromium phase but decreases hydrogenated amorphous carbon phase. The film’s hardness increases by enhancing the negative substrate bias and raising the deposition temperature, which could be attributed to the increase of film density and the Hall–Petch strengthening effect induced by the nanoscale crystallization of the amorphous carbide phase.

Deposition Temperature Effect on the Structure and Optical Property of RF-PACVD-Derived Hydrogenated SiCNO Film

2006 ◽  
Vol 37 (2) ◽  
pp. 173-177 ◽  
Author(s):  
Y. Zhou ◽  
X. Yan ◽  
E. Kroke ◽  
R. Riedel ◽  
D. Probst ◽  
...  
Keyword(s):  
Optical Property ◽  
Temperature Effect ◽  
Deposition Temperature
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