Interaction of intense nanosecond pulses of extreme ultraviolet (EUV) with gases and solids (Conference Presentation)

2019 ◽  
Author(s):  
Andrzej S. Bartnik ◽  
Wojciech Skrzeczanowski ◽  
Joanna Czwartos ◽  
Jerzy Kostecki ◽  
Henryk Fiedorowicz ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Nanosecond Pulses

scholarly journals Response of fusion plasma-facing materials to nanosecond pulses of extreme ultraviolet radiation

2018 ◽  
Vol 36 (3) ◽  
pp. 293-307 ◽  
Author(s):  
Jaroslav Straus ◽  
Karel Kolacek ◽  
Jiri Schmidt ◽  
Oleksandr Frolov ◽  
Monika Vilemova ◽  
...  
Keyword(s):  
Structural Changes ◽  
Focused Ion Beam ◽  
Extreme Ultraviolet ◽  
Laser Energy ◽  
Ion Beam ◽  
Fusion Plasma ◽  
Nanosecond Pulses ◽  
Circular Holes ◽  
Crater Morphology ◽  
Extreme Ultraviolet Radiation

AbstractThe experimental study of damage to tungsten (W), molybdenum (Mo), and silicon carbide (SiC) surfaces induced by focused extreme ultraviolet laser radiation (λ ~ 47 nm/~1.5 ns/21–40 µJ) is presented. It was found that W and Mo behaved similarly: during the first shot, the damaged area is covered by melted and re-solidified material, in which circular holes appear – residua of just opened pores/bubbles, from which pressurized gas/vapors escaped. Next cracks and ruptures appear and the W has a tendency to delaminate its surface layer. Contrary, single-crystalline SiC has negligible porosity and sublimates; therefore, no escape of “pressurized” gas and no accompanying effects take place. Moreover, SiC at sublimating temperature decomposes to elements; therefore, the smooth crater morphology can be related to local laser energy density above ablation threshold. When more shots are accumulated, in all three investigated materials, the crater depth increases non-linearly with number of these shots. The surface morphology was investigated by an atomic force microscope, the surface structure was imaged by a scanning electron microscope (SEM), and the structure below the surface was visualized by SEM directed into a trench that is milled by focused ion beam. Additionally, structural changes in SiC were revealed by Raman spectroscopy.

scholarly journals EUV ablation of organic polymers at a high fluence

2014 ◽  
Vol 2 ◽  
Author(s):  
Chiara Liberatore ◽  
Klaus Mann ◽  
Matthias Müller ◽  
Ladislav Pina ◽  
Libor Juha ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Preliminary Investigation ◽  
Surface Region ◽  
Polymer Materials ◽  
Near Surface ◽  
Polymer Molecules ◽  
Nanosecond Pulses ◽  
Volatile Products ◽  
Discharge Laser

Abstract A preliminary investigation on short-wavelength ablation mechanisms of poly(methyl methacrylate) (PMMA) and poly (1,4-phenylene ether ether-sulfone) (PPEES) by extreme ultraviolet (EUV) radiation at 13.5 nm using a table-top laser-produced plasma from a gas-puff target at LLG (Göttingen) and at 46.9 nm by a 10 Hz desktop capillary discharge laser operated at the Institute of Physics (Prague) is presented. Ablation of polymer materials is initiated by photo-induced polymer chain scissions. The ablation occurs due to the formation of volatile products by the EUV radiolysis removed as an ablation plume from the irradiated material into the vacuum. In general, cross-linking of polymer molecules can compete with the chain decomposition. Both processes may influence the efficiency and quality of micro(nano)structuring in polymer materials. Wavelength is a critical parameter to be taken into account when an EUV ablation process occurs, because different wavelengths result in different energy densities in the near-surface region of the polymer exposed to nanosecond pulses of intense EUV radiation.

scholarly journals Spontaneous and artificial direct nanostructuring of solid surface by extreme ultraviolet laser with nanosecond pulses

2015 ◽  
Vol 34 (1) ◽  
pp. 11-22 ◽  
Author(s):  
K. Kolacek ◽  
J. Schmidt ◽  
J. Straus ◽  
O. Frolov ◽  
V. Prukner ◽  
...  
Keyword(s):  
Interference Pattern ◽  
Extreme Ultraviolet ◽  
Target Surface ◽  
Surface Structures ◽  
Periodic Surface ◽  
Nanosecond Pulses ◽  
Point Image ◽  
Diffraction Patterns ◽  
Focused Beams ◽  
Incoming Laser

AbstractNanostructuring can be either spontaneously appearing (such as laser-induced periodic surface structures, and diffraction patterns – for example, in windows of grid proximity-standing at the ablated target-surface) or artificially created (like – as we hoped – interference patterns) that can be in some extend controlled. Due to that a new interferometer (belonging to wave-front division category) with two aspheric mirrors has been developed. Each of these mirrors reflects approximately one half of incoming laser beam and focuses it into a point image. Both focused beams have to intersect each other, and in the intersection region an interference pattern was expected. However, the first tests showed that some other spontaneously appearing interference pattern with substantially larger fringe-pitch is generated. The origin of this idle interference pattern is discussed.

scholarly journals Physico-Chemical Surface Modifications of Polyetheretherketone (PEEK) Using Extreme Ultraviolet (EUV) Radiation and EUV-Induced Nitrogen Plasma

Materials ◽  
2020 ◽  
Vol 13 (19) ◽  
pp. 4466
Author(s):  
Joanna Czwartos ◽  
Bogusław Budner ◽  
Andrzej Bartnik ◽  
Przemysław Wachulak ◽  
Henryk Fiedorowicz ◽  
...  
Keyword(s):  
Low Temperature ◽  
Photoelectron Spectroscopy ◽  
Extreme Ultraviolet ◽  
Chemical Properties ◽  
Nitrogen Plasma ◽  
Average Roughness ◽  
Temperature Plasma ◽  
Chemical Surface ◽  
Nanosecond Pulses ◽  
Physico Chemical

In this work, the effect of extreme ultraviolet (EUV) radiation and the combination of EUV radiation and low-temperature nitrogen plasma on the physico-chemical properties of polyetheretherketone (PEEK) surfaces were presented. The laser-plasma EUV source based on a double gas puff target was used in this experiment to irradiate PEEK surfaces with nanosecond pulses of EUV radiation and to produce low-temperature plasma through the photoionization of nitrogen with EUV photons. The changes in surface morphology on irradiated polymer samples were examined using atomic force microscopy (AFM) and scanning electron microscopy (SEM). Chemical changes of the PEEK surfaces were analysed using X-ray photoelectron spectroscopy (XPS). EUV radiation and nitrogen plasma treatment caused significant changes in the topography of modified PEEK’s surfaces and an increase in their average roughness. Strong chemical decomposition, appearance of new functional groups as well as incorporation of nitrogen atoms up to ~17 at.% on the PEEK’s surface were observed.

Photoionization of Atomic Neon Induced Using Nanosecond Pulses of Extreme Ultraviolet (EUV)

2018 ◽  
pp. 203-211 ◽  
Author(s):  
I. Saber ◽  
A. Bartnik ◽  
P. Wachulak ◽  
W. Skrzeczanowski ◽  
R. Jarocki ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Nanosecond Pulses

Spectral investigations of low-temperature plasma induced in CO2 gas by nanosecond pulses of extreme ultraviolet (EUV)

2021 ◽  
Author(s):  
Andrzej Bartnik ◽  
Wojciech Skrzeczanowski ◽  
Przemyslaw Wachulak ◽  
Tomasz Fok ◽  
Łukasz Węgrzyński ◽  
...  
Keyword(s):  
Low Temperature ◽  
Extreme Ultraviolet ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Co2 Gas ◽  
Nanosecond Pulses

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

2018 ◽  
Vol 189 (03) ◽  
pp. 323-334 ◽  
Author(s):  
D.B. Abramenko ◽  
P.S. Antsiferov ◽  
D.I. Astakhov ◽  
Aleksandr Yu. Vinokhodov ◽  
Il'ya Yu. Vichev ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Mask Inspection ◽  
Extreme Ultraviolet Radiation
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