Oligomers of MORE: Molecular Organometallic Resists for EUV

Advances in Patterning Materials and Processes XXXVI ◽

10.1117/12.2516010 ◽

2019 ◽

Author(s):

Shaheen Hasan ◽

Michael Murphy ◽

Maximilian Weires ◽

Steven Grzeskowiak ◽

Greg Denbeaux ◽

...

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