Simulation of statistical effects in exposure and development of EUV photoresists using the percolation and diffusion limited aggregation model
Keyword(s):
1988 ◽
Vol 21
(20)
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pp. L995-L1001
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Keyword(s):
1995 ◽
Vol 57
(5)
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pp. 651-677
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1993 ◽
Vol 119
(3)
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pp. 379-386
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Keyword(s):
1986 ◽
Vol 56
(4)
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pp. 336-339
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Keyword(s):
2006 ◽
Vol 13
(2)
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pp. 117-120
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