Electrically measurable test structures to capture and classify EUV stochastics

Extreme Ultraviolet (EUV) Lithography X ◽

10.1117/12.2515418 ◽

2019 ◽

Author(s):

Hemant Vats ◽

Ryan Ryoung Han Kim ◽

Yasser Sherazi ◽

Youssef Drissi ◽

Kurt Ronse

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