Enabling enhanced EUV lithographic performance using advanced SMO, OPC, and RET

International Conference on Extreme Ultraviolet Lithography 2018 ◽

10.1117/12.2502809 ◽

2019 ◽

Author(s):

Germain L. Fenger ◽

Ana-Maria Armeanu ◽

Vicky Philipsen ◽

Fan Jiang ◽

Neal Lafferty ◽

...

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