scholarly journals Defect avoidance for extreme ultraviolet mask defects using intentional pattern deformation

2018 ◽  
Author(s):  
Yoo-Jin Chae ◽  
Puneet Gupta ◽  
Rik Jonckheere
Keyword(s):  
Extreme Ultraviolet ◽  
Defect Avoidance

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

2018 ◽  
Vol 189 (03) ◽  
pp. 323-334 ◽  
Author(s):  
D.B. Abramenko ◽  
P.S. Antsiferov ◽  
D.I. Astakhov ◽  
Aleksandr Yu. Vinokhodov ◽  
Il'ya Yu. Vichev ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Mask Inspection ◽  
Extreme Ultraviolet Radiation

Equipment for Subpicosecond Extreme Ultraviolet Facility.

1986 ◽  
Author(s):  
Charles K. Rhodes ◽  
Keith Boyer ◽  
Tsing Shan Luk
Keyword(s):  
Extreme Ultraviolet

Surface potential of liquid microjet investigated using extreme ultraviolet photoelectron spectroscopy

2020 ◽  
Vol 152 (14) ◽  
pp. 144503
Author(s):  
Junichi Nishitani ◽  
Shutaro Karashima ◽  
Christopher W. West ◽  
Toshinori Suzuki
Keyword(s):  
Surface Potential ◽  
Photoelectron Spectroscopy ◽  
Extreme Ultraviolet ◽  
Ultraviolet Photoelectron Spectroscopy
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