Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography

1996 ◽  
Author(s):  
Hans W. P. Koops ◽  
Sergey V. Babin ◽  
Mark A. Weber ◽  
G. Dahm ◽  
A. Holopkin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Dimensional Electron

Three-dimensional electron-beam lithography simulator V2.0 for the gigabit-era photomask manufacturing

1997 ◽  
Author(s):  
Yoo-Hyon Kim ◽  
Byung-Cheol Cha ◽  
Hoong-Joo Lee ◽  
Jung-Min Sohn ◽  
Jeong-Taek Kong ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Dimensional Electron
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