Improved UV-fiber for 193-nm excimer laser applications

1996 ◽  
Author(s):  
Peter Karlitzschek ◽  
Karl-Friedrich Klein ◽  
Georg Hillrichs ◽  
Ulrich Grzesik
Keyword(s):  
Excimer Laser ◽  
Laser Applications ◽  
193 Nm

Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser

1988 ◽  
Vol 45 (4) ◽  
pp. 361-364 ◽  
Author(s):  
F. Foulon ◽  
E. Fogarassy ◽  
A. Slaoui ◽  
C. Fuchs ◽  
S. Unamuno ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Melting Threshold ◽  
193 Nm

Excimer Laser (193 nm) Myopic Keratomileusis in Sighted and Blind Human Eyes

1990 ◽  
Vol 6 (3) ◽  
pp. 165-173 ◽  
Author(s):  
Theo Seiler ◽  
Gunter Kahle ◽  
Martin Kriegerowski
Keyword(s):  
Excimer Laser ◽  
193 Nm ◽  
Human Eyes

Long-time radiation-resistant optical coatings for UV excimer laser applications

2001 ◽  
Author(s):  
Sven Laux ◽  
Helmut Bernitzki ◽  
Michael Klaus ◽  
Hans Lauth ◽  
Norbert Kaiser
Keyword(s):  
Excimer Laser ◽  
Optical Coatings ◽  
Laser Applications ◽  
Long Time ◽  
Radiation Resistant

scholarly journals 193-nm deep-UV lithography system using a line-narrowed ArF excimer laser

1993 ◽  
Author(s):  
Bruce W. Smith ◽  
Malcolm C. Gower ◽  
Mark Westcott ◽  
Lynn F. Fuller
Keyword(s):  
Excimer Laser ◽  
Uv Lithography ◽  
Arf Excimer Laser ◽  
Deep Uv ◽  
193 Nm ◽  
Lithography System
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