Plasma impedance and electron density in a pulsed superradiant gas laser channel

1996 ◽  
Author(s):  
K. H. Tsui
Keyword(s):  
Electron Density ◽  
Gas Laser ◽  
Laser Channel ◽  
Plasma Impedance

Plasma impedance and electron density in a pulsed laser channel

1996 ◽  
Vol 79 (11) ◽  
pp. 8269-8273 ◽  
Author(s):  
K. H. Tsui ◽  
G. H. Cavalcanti ◽  
A. S. Farias ◽  
M. D. S. Marinha ◽  
L. M. Soares ◽  
...  
Keyword(s):  
Electron Density ◽  
Pulsed Laser ◽  
Laser Channel ◽  
Plasma Impedance

Determination of the electron density in a plasma using a gas laser with a nonlinearly absorbing cell

1972 ◽  
Vol 17 (4) ◽  
pp. 1350-1351
Author(s):  
A. A. Voitovich ◽  
V. A. Komar ◽  
A. Ya. Smirnov
Keyword(s):  
Electron Density ◽  
Gas Laser

A new method of electron density measurement applied to a CW 337μm HCN gas laser

1975 ◽  
Vol 8 (10) ◽  
pp. 866-870 ◽  
Author(s):  
P Belland ◽  
A I Ciura ◽  
D Veron ◽  
L B Whitbourn
Keyword(s):  
Electron Density ◽  
Density Measurement ◽  
New Method ◽  
Gas Laser

scholarly journals Electron density and electron neutral collision frequency in the ionosphere using plasma impedance probe measurements

2008 ◽  
Vol 113 (A9) ◽  
pp. n/a-n/a ◽  
Author(s):  
E. Spencer ◽  
S. Patra ◽  
T. Andriyas ◽  
C. Swenson ◽  
J. Ward ◽  
...  
Keyword(s):  
Electron Density ◽  
Collision Frequency ◽  
Plasma Impedance ◽  
Impedance Probe ◽  
Probe Measurements

GAS LASER MEASUREMENTS OF THE ELECTRON DENSITY OF A PLASMA PRODUCED BY A VERY FAST THETA‐PINCH PREHEATER

1965 ◽  
Vol 7 (2) ◽  
pp. 29-30 ◽  
Author(s):  
A. C. C. Warnock ◽  
W. M. Deuchars ◽  
J. Irving ◽  
D. E. Kidd
Keyword(s):  
Electron Density ◽  
Gas Laser ◽  
Laser Measurements ◽  
Theta Pinch

Measurement of absolute electron density with a plasma impedance probe

2005 ◽  
Vol 76 (2) ◽  
pp. 023503 ◽  
Author(s):  
David D. Blackwell ◽  
David N. Walker ◽  
William E. Amatucci
Keyword(s):  
Electron Density ◽  
Plasma Impedance ◽  
Impedance Probe

Plasma Impedance Tuning Effect on Nanostructure of Diamond Films

2013 ◽  
Vol 394 ◽  
pp. 32-37 ◽  
Author(s):  
W. Thowladda ◽  
S.T. Khlayboonme
Keyword(s):  
Electron Density ◽  
Raman Spectra ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Chemistry ◽  
Optical Emission ◽  
Peak Position ◽  
High Electron ◽  
Plasma Impedance ◽  
Inductive Component

The morphology and structure of nanocrystalline diamond films as well as the plasma chemistry were studied by altering the plasma impedance. These impedances related to electron density were altered via the matching system. Two films were grown by the microwave plasma under different values of the plasma impedance, resulting in low and high electron densities in the plasma. By the use of measurements of plasma impedance and optical emission, the lowering of an inductive component of the impedance, indicating an increasing electron density, encouraged H-radical concentration present in the plasma. As the plasma was changed to the high electron density, Raman spectra of the films showed the sp3Raman peak shifted from 1325 to 1328.5 cm-1with narrower broadening. This behavior arose from an increase in grain size, corresponding to images from a field emission scanning electron microscope. Raman spectra of G-peak position and white light reflectometry showed a reduction in sp2carbon content of the film. The G-peak shifted from 1564 to 1541 cm-1and refractive index increased from 1.84 to 2.16. The formation of the films related to the concentrations of H and CH3radicals. The plasma impedance affected the radical concentrations.

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