Investigating the effect of ionizing radiation on the acid concentration necessary for dissolution of chemically amplified EUV photoresists
2010 ◽
Vol 49
(9)
◽
pp. 096506
◽
1967 ◽
Vol 64
(6)
◽
pp. 1306-1309
1983 ◽
Vol 41
◽
pp. 368-369
1980 ◽
Vol 13
(1)
◽
pp. 109-113
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