Investigating the effect of ionizing radiation on the acid concentration necessary for dissolution of chemically amplified EUV photoresists

Author(s):  
Steven Grzeskowiak ◽  
Jake Kaminsky ◽  
Jonathan Chandonait ◽  
Greg H. Denbeaux ◽  
Sean Gibbons ◽  
...  
2000 ◽  
Vol 636 ◽  
Author(s):  
Gilbert D. Feke ◽  
Robert D. Grober ◽  
Gerd Pohlers ◽  
James F. Cameron

AbstractWe describe a method based on single molecule probing of acid concentration to measure the profiles of photogenerated acid patterns in chemically amplified resist films. We further present preliminary data which demonstrates the viability of this method.


Author(s):  
M. L. Knotek

Modern surface analysis is based largely upon the use of ionizing radiation to probe the electronic and atomic structure of the surfaces physical and chemical makeup. In many of these studies the ionizing radiation used as the primary probe is found to induce changes in the structure and makeup of the surface, especially when electrons are employed. A number of techniques employ the phenomenon of radiation induced desorption as a means of probing the nature of the surface bond. These include Electron- and Photon-Stimulated Desorption (ESD and PSD) which measure desorbed ionic and neutral species as they leave the surface after the surface has been excited by some incident ionizing particle. There has recently been a great deal of activity in determining the relationship between the nature of chemical bonding and its susceptibility to radiation damage.


Sign in / Sign up

Export Citation Format

Share Document