On-line concentration measurement system with optical fibers

1990 ◽  
Author(s):  
Jianshu Li
Keyword(s):  
Optical Fibers ◽  
Measurement System ◽  
Concentration Measurement ◽  
On Line

On-line measurement system of displacement with PSD sensor

2006 ◽  
Author(s):  
Yongcai Yang ◽  
Junsan Ma ◽  
Rimin Pan ◽  
Xiang Yu
Keyword(s):  
Measurement System ◽  
Line Measurement ◽  
On Line ◽  
Psd Sensor

Implementation for High-Precision and Non-Contact System for the Measurement of Crankshaft and Camshaft

2011 ◽  
Vol 301-303 ◽  
pp. 959-964 ◽  
Author(s):  
Da Lin Cheng ◽  
Yi Wang ◽  
Yong Jie Ren ◽  
Xue You Yang
Keyword(s):  
Standard Deviation ◽  
High Precision ◽  
Measurement System ◽  
General Structure ◽  
Contact System ◽  
Scanning Laser ◽  
Test Results ◽  
Line Measurement ◽  
On Line ◽  
High Depth

A novel crankshaft and camshaft measurement system by optoelectronic scanning of which a flat-crystal was used to generate high depth of parallelism scanning laser was implemented. The general structure and principle were given. Mass of test results showed that the system could achieve high precision. The ranges could achieve ±8μm, standard deviation could achieve 3μm, and easy to operate, work reliably, automatically and on line measurement could be implemented.

A Measurement System for Step Imprint Lithography

2005 ◽  
Vol 295-296 ◽  
pp. 107-112 ◽  
Author(s):  
H.Z. Liu ◽  
Bing Heng Lu ◽  
Y.C. Ding ◽  
D.C. Li ◽  
Yi Ping Tang ◽  
...  
Keyword(s):  
Measurement System ◽  
Special Structure ◽  
Nanometer Scale ◽  
Pattern Transfer ◽  
Imprint Lithography ◽  
Line Position ◽  
Measuring Range ◽  
Optical Reflection ◽  
On Line ◽  
Laser Interferometers

A precision 6-degree-of-freedom measurement system has been developed for simultaneous on-line measurements of imprint lithography stage. To successfully accomplish nanometer-scale pattern transfer from mold to resist film on the wafer, two types of positioning methods, static and dynamic, are used in this system. Two laser interferometers, two optical reflection mirrors and special structure on the stage with 3 elastic tracks are employed in this system to detect the positions and rotations of the stage. Through an algorithm, measurements of pitch, yaw and roll motions can be achieved. This system can realize on-line position detecting. Based on adjusting of PZTs, the detecting precision can reach 10nm and ±3 milli-arcsec, respectively. The measuring range can reach 100mm and ±10 arcsec, respectively.

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