Influence of temperature and environment on the laser damage threshold of ion-beam sputtered anti-reflective coatings at 355 nm wavelength

2017 ◽  
Author(s):  
Roelene Botha ◽  
Thomas Gischkat ◽  
Igor Stevanovic ◽  
Andreas Bächli ◽  
David Bischof ◽  
...  
Keyword(s):  
Ion Beam ◽  
Damage Threshold ◽  
Laser Damage Threshold ◽  
Laser Damage ◽  
Influence Of Temperature ◽  
Reflective Coatings

Anisotropic ion beam etching of fused silica to mitigate subsurface damage

2020 ◽  
Vol 34 (08) ◽  
pp. 2050060 ◽  
Author(s):  
Bo Li ◽  
Xia Xiang ◽  
Chengxiang Tian ◽  
Chunyuan Hou ◽  
Wei Liao ◽  
...  
Keyword(s):  
Surface Quality ◽  
Surface Defects ◽  
Silica Surface ◽  
Incident Angle ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Laser Damage Threshold ◽  
Laser Damage ◽  
Ion Beam Etching

The laser damage resistance of fused silica optics depends significantly on the surface quality. In this work, anisotropic etching with inert ion beams at various ion incident angles was performed to investigate the evolution of the fused silica surface. The results show that the surface is smoothed when the incident angle is below [Formula: see text]. However, the fused silica surface starts to become coarse owing to the formation of nanostructures on the surface when the incident angle exceeds [Formula: see text]. Further, ion beam etching at a large incident angle of [Formula: see text] removes subsurface defects and less induces nanostructures, resulting in reduction of the surface roughness. The concentrations of impurities and defects are both significantly reduced after ion beam etching. The surface quality, subsurface and surface defects, and surface impurities determine the variation in the laser damage threshold of fused silica with the ion incident angle. The results demonstrate successful application of ion beam etching to improve the laser damage resistant characteristics of fused silica optics. Ion beam etching is a very versatile tool that provides physical erosion to anisotropically mitigate surface damage of fused silica.

scholarly journals Substrate Cleaning Processes and Their Influence on the Laser Resistance of Anti-Reflective Coatings

2020 ◽  
Vol 10 (23) ◽  
pp. 8496
Author(s):  
Thomas Gischkat ◽  
Daniel Schachtler ◽  
Igor Stevanovic ◽  
Zoltan Balogh-Michels ◽  
Roelene Botha ◽  
...  
Keyword(s):  
Particle Density ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Limiting Factors ◽  
Laser Damage ◽  
Angle Of Incidence ◽  
Laser Induced Damage ◽  
Reflective Coatings ◽  
Substrate Cleaning

Substrate cleaning prior to coating has a strong influence on the performance of the optical component. Exemplary, none or inadequate cleaning reduces the resistance against laser irradiation drastically. Especially in laser components coated with anti-reflective layers, the interface between substrate and coating is one of the most limiting factors. This study investigates different precision cleaning processes and their influence on the laser resistance of ion-beam sputtered anti-reflective coatings. Therefore, a SiO2/Ta2O5 multilayer anti-reflective coating for a wavelength of 1064 nm and a normal angle of incidence was deposited onto high-quality fused silica substrates. Prior to deposition, the substrates were cleaned with various cleaning processes using different solutions and ultrasonic frequencies. To characterize the cleaned surface quality, the surfaces were analyzed with respect to root-mean-square (RMS) roughness and particle density. Laser damage was measured using a 1064 nm ns-pulsed laser test bench. It was found that an alcoholic pre-clean is recommendable to prevent laser damage caused by organic films remaining from the polishing process. The applied ultrasonic frequencies strongly influenced the particle density down to the sub-micrometer range and in consequence, the laser-induced damage threshold (LIDT). Ultrasonic cleaning at excessive power levels can reduce laser resistance.

Influence of the assisting-ion-beam parameters on the laser-damage threshold of SiO2 films

1999 ◽  
Vol 338 (1-2) ◽  
pp. 269-275 ◽  
Author(s):  
M. Alvisi ◽  
G. De Nunzio ◽  
M.R. Perrone ◽  
A. Rizzo ◽  
S. Scaglione ◽  
...  
Keyword(s):  
Ion Beam ◽  
Damage Threshold ◽  
Laser Damage Threshold ◽  
Laser Damage ◽  
Sio2 Films ◽  
Beam Parameters

Bulk Laser Damage Threshold and Stimulated Raman Scattering in KTiOPO4 Crystal.

1996 ◽  
Vol 24 (8) ◽  
pp. 906-909
Author(s):  
Akio MIYAMOTO ◽  
Hidetsugu YOSHIDA ◽  
Yusuke MORI ◽  
Takatomo SASAKI ◽  
Sadao NAKAI
Keyword(s):  
Raman Scattering ◽  
Stimulated Raman Scattering ◽  
Damage Threshold ◽  
Laser Damage Threshold ◽  
Laser Damage ◽  
Stimulated Raman

Improving the performance of high-laser-damage-threshold, multilayer dielectric pulse-compression gratings through low-temperature chemical cleaning

2013 ◽  
Vol 52 (8) ◽  
pp. 1682 ◽  
Author(s):  
Heather P. Howard ◽  
Anthony F. Aiello ◽  
Justin G. Dressler ◽  
Nicholas R. Edwards ◽  
Terrance J. Kessler ◽  
...  
Keyword(s):  
Low Temperature ◽  
Pulse Compression ◽  
Damage Threshold ◽  
Laser Damage Threshold ◽  
Laser Damage ◽  
Chemical Cleaning ◽  
High Laser ◽  
Multilayer Dielectric

Modeling of femtosecond laser damage threshold on the two-layer metal films

2010 ◽  
Vol 257 (5) ◽  
pp. 1678-1683 ◽  
Author(s):  
A.M. Chen ◽  
H.F. Xu ◽  
Y.F. Jiang ◽  
L.Z. Sui ◽  
D.J. Ding ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Damage Threshold ◽  
Metal Films ◽  
Laser Damage Threshold ◽  
Laser Damage
Sign in / Sign up

Export Citation Format

Share Document