Laser-induced modifications in fused silica up to damage initiation caused by multiple UV nanosecond pulses

2017 ◽  
Author(s):  
Alexandre Beaudier ◽  
Frank R. Wagner ◽  
Jean-Yves Natoli
Keyword(s):  
Fused Silica ◽  
Damage Initiation ◽  
Nanosecond Pulses

Self-focusing and surface damage in fused-silica windows of variable thickness with UV nanosecond pulses

2004 ◽  
Author(s):  
Herve Bercegol ◽  
Alain C. L. Boscheron ◽  
C. Lepage ◽  
Elizabeth Mazataud ◽  
Thierry Donval ◽  
...  
Keyword(s):  
Variable Thickness ◽  
Surface Damage ◽  
Fused Silica ◽  
Nanosecond Pulses ◽  
Self Focusing

scholarly journals Characterization of ejected fused silica particles following surface breakdown with nanosecond pulses

2012 ◽  
Vol 20 (25) ◽  
pp. 27708 ◽  
Author(s):  
Rajesh N. Raman ◽  
Selim Elhadj ◽  
Raluca A. Negres ◽  
Manyalibo J. Matthews ◽  
Michael D. Feit ◽  
...  
Keyword(s):  
Silica Particles ◽  
Fused Silica ◽  
Nanosecond Pulses ◽  
Surface Breakdown

scholarly journals UV-laser conditioning for reduction of 351-nm damage initiation in fused silica

2002 ◽  
Author(s):  
Raymond M. Brusasco ◽  
Bernie M. Penetrante ◽  
John E. Peterson ◽  
Stephen M. Maricle ◽  
Joseph A. Menapace
Keyword(s):  
Fused Silica ◽  
Uv Laser ◽  
Damage Initiation ◽  
Laser Conditioning

scholarly journals Micromachining of Diffractive Optical Elements Embedded in Bulk Fused Silica by Nanosecond Pulses

2011 ◽  
Vol 29 (6) ◽  
pp. 850-855 ◽  
Author(s):  
Francisco Javier Salgado-Remacha ◽  
Luis Miguel Sanchez-Brea ◽  
Eusebio Bernabeu
Keyword(s):  
Fused Silica ◽  
Diffractive Optical Elements ◽  
Optical Elements ◽  
Nanosecond Pulses

Measurement and prediction of rear surface damage in fused silica windows caused by UV nanosecond pulses

2005 ◽  
Author(s):  
Herve Bercegol ◽  
Thierry Donval ◽  
Benjamin Forestier ◽  
Laurent Lamaignere ◽  
Marc Loiseau ◽  
...  
Keyword(s):  
Rear Surface ◽  
Surface Damage ◽  
Fused Silica ◽  
Nanosecond Pulses

Microcharacterization of Defects Induced in Fused Silica by High Power 3ω UV (355nm) Laser Pulses

2001 ◽  
Vol 7 (S2) ◽  
pp. 496-497
Author(s):  
Marion A. Stevens-Kalceff ◽  
Joe Wong ◽  
Andre Stesmans
Keyword(s):  
High Power ◽  
Lawrence Livermore National Laboratory ◽  
National Laboratory ◽  
Fused Silica ◽  
Mitigation Strategies ◽  
Powerful Laser ◽  
Fusion Reactions ◽  
Damage Initiation ◽  
Essential Components ◽  
Induced Defects

There are many technical challenges to be overcome before controlled fusion reactions can be achieved. The National Ignition Facility (NIF) at Lawrence Livermore National Laboratory is being developed to initiate fusion reactions using the world's most powerful laser. Essential components of the Facility are the ultra pure silica (SiO2) lenses that focus the powerful laser beams on to the target. Irradiation with a high power laser has been observed to damage the silica lenses, resulting in the formation of defects. The ensuing degradation of the lens performance necessitates its replacement. It is therefore critical to characterize the induced defects and understand the laser damage initiation and evolution, so that damage mitigation strategies can be developed.Cathodoluminescence (CL) microscopy and spectroscopy enables high spatial resolution and high sensitivity detection of defects in poorly conducting materials. It is therefore an ideal microanalytical technique with which to study laser irradiation-induced defects.

Material Processing Using Femtosecond Lasers: Repairing Patterned Photomasks

MRS Bulletin ◽  
2006 ◽  
Vol 31 (8) ◽  
pp. 634-638 ◽  
Author(s):  
Richard Haight ◽  
Peter Longo ◽  
Alfred Wagner
Keyword(s):  
Semiconductor Industry ◽  
Femtosecond Laser Ablation ◽  
Laser Pulses ◽  
Repair Process ◽  
Spot Size ◽  
Fused Silica ◽  
Ultrafast Laser Pulses ◽  
Light Pulses ◽  
Nanosecond Pulses ◽  
Silica Substrates

AbstractThe use of ultrafast laser pulses is having an impact on materials processing in profound ways. “Machining” with femtosecond pulses affords considerable advantages over nanosecond pulses, such as subdiffraction-limited material ablation, where ablated spot dimensions are below that achievable when longer pulses are focused to the minimum spot size dictated by optical physics. These properties have been exploited to address what had become a critical problem in the semiconductor industry, the repair of patterned photomasks. We will describe how the fundamentals of femtosecond laser ablation have been implemented in a machine designed to repair photomasks. We will also describe experiments designed to deposit Cr metal onto fused-silica substrates using 100-fs, 400-nm light pulses at atmospheric pressure. Multiphoton dissociation of Cr(CO)6 adsorbed on fused-silica substrates initiates Cr deposition. The mechanisms for deposition on both transparent (fused silica) and absorbing (Cr metal) substrates are discussed. Finally, we describe experiments that were carried out to extend the photomask repair process to shorter wavelengths (below 200 nm) using light generated by frequency-mixing of ultrashort, 30-fs pulses in an Ar-filled capillary.

CO 2 -laser polishing for reductoin of 351-nm surface damage initiation in fused silica

2002 ◽  
Author(s):  
Raymond M. Brusasco ◽  
Bernie M. Penetrante ◽  
Jim A. Butler ◽  
Stephen M. Maricle ◽  
John Peterson
Keyword(s):  
Surface Damage ◽  
Fused Silica ◽  
Laser Polishing ◽  
Damage Initiation

scholarly journals Determination of laser damage initiation probability and growth on fused silica scratches

2010 ◽  
Author(s):  
Mary A. Norton ◽  
C. Wren Carr ◽  
David A. Cross ◽  
Raluca A. Negres ◽  
Jeffrey D. Bude ◽  
...  
Keyword(s):  
Fused Silica ◽  
Laser Damage ◽  
Damage Initiation
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