New PSM optimized for stable resolution of fine holes in FPD

Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2278689 ◽

2017 ◽

Author(s):

Nobuhisa Imashiki ◽

Michihiko Hayase ◽

Yutaka Yoshikawa

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