Stabilize OMOG photomask post-repair CD variation by cleaning strategy and post-repair treatment

Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2277685 ◽

2017 ◽

Author(s):

Vincent Shen ◽

Josh Tzeng ◽

Kuang Huang ◽

Vic Chang

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