Study on Brewster angle thin film polarizer using hafnia-silica mixture as high refractive index material

2017 ◽  
Author(s):  
Nuo Xu ◽  
Meiping Zhu ◽  
Jianda Shao ◽  
yuanan Zhao ◽  
Yingjie Chai ◽  
...  
Keyword(s):  
Thin Film ◽  
Refractive Index ◽  
High Refractive Index ◽  
Brewster Angle ◽  
Refractive Index Material

scholarly journals Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source

Crystals ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 424
Author(s):  
Hanbin Lee ◽  
Minjeong Park ◽  
Minhyon Jeon ◽  
Byeongcheol Kim
Keyword(s):  
Thin Film ◽  
Refractive Index ◽  
Visible Light ◽  
Inductively Coupled Plasma ◽  
High Refractive Index ◽  
Mechanical Tests ◽  
Optical Simulation ◽  
Optical Thin Film ◽  
Inductively Coupled ◽  
Refractive Index Material

The research on anti-reflection (AR) optical thin film has long sought to obtain high-performance reflection and transmission properties in photovoltaic and photonic devices. The study of multi-layer AR (M-AR) film with low- and high-refractive-index materials is essential to increase the selective transmittance and reflectance at visible light wavelengths. However, M-AR film exhibits low substrate adhesion and slow deposition rates. We developed a DC pulse sputter system incorporating an inductively coupled plasma (ICP) source of high density to obtain high-quality M-AR film. Six-layer AR optical thin film was simulated using SiOx as a low-refractive-index material and NbOx as a high-refractive-index material. The multi-layer AR film based on SiOx and NbOx (M-SiNb) was fabricated using DC pulse sputtering which incorporated an ICP source. M-SiNb film exhibited better properties than the optical simulation results at 550 nm (transmittance: 99.19%, reflectance: 0.87%). Similarly, the M-SiNb film fabricated using the ICP source had high transmittance and reflectance in the visible light region and excellent adhesion to the substrate notwithstanding the various mechanical tests it was subjected to. Consequently, the development of the DC pulse sputter system included the ICP source, and this study represents important research in the field of optical film.

scholarly journals Fabrication of High Refractive Index ZrO2 Thin Film by a Layer-by-layer Self-assembly Method

2017 ◽  
Vol 30 (4) ◽  
pp. 199-203
Author(s):  
Chang-Sik Choi ◽  
Ji-Sun Lee ◽  
Mi-Jai Lee ◽  
Young-Jin Lee ◽  
Dae-Woo Jeon ◽  
...  
Keyword(s):  
Thin Film ◽  
Refractive Index ◽  
Self Assembly ◽  
High Refractive Index ◽  
Layer By Layer ◽  
Zro2 Thin Film ◽  
Assembly Method

Mechanically Tunable Thin Film High Refractive Index Contrast TiO2–Gratings in Elastomeric Matrix

2015 ◽  
Author(s):  
Philipp Gutruf ◽  
Eike Zeller ◽  
Sumeet Walia ◽  
Shruti Nirantar ◽  
Sharath Sriram ◽  
...  
Keyword(s):  
Thin Film ◽  
Refractive Index ◽  
High Refractive Index ◽  
Refractive Index Contrast ◽  
Elastomeric Matrix ◽  
Index Contrast

Design of Optical Thin Film Filter for Sensor Network

2015 ◽  
Vol 3 (1) ◽  
Author(s):  
Vahideh Khadem Hosseini ◽  
Mohammad Taghi Ahmadi
Keyword(s):  
Thin Film ◽  
Refractive Index ◽  
Silicon Dioxide ◽  
Human Body ◽  
High Refractive Index ◽  
Structural Factors ◽  
Optical Thin Film ◽  
Fabry Perot ◽  
Detection Of Objects ◽  
Low Refractive Index

Human body detection is very important especially in the countries prone to earthquakes. Fabry-Perot filter as an ideal option in this field needs to be explored. This filter is useful for detection of objects that have temperature around that of the human body. In the presented research, an optical thin film Fabry-Perot filter (FPF) at the wavelength about 8 um to 14 um is investigated. The important factors on transmission spectrum and the band width of filter are discussed. Additionally structural factors such as layers material and their thickness are explored. Various materials with high and low refractive index are examined by TFCalc3.5 for thin film layers. Germanium (Ge) with the refractive index 4.20 is selected for layer with high refractive index and Silicon Dioxide (SiO2) with the refractive index 1.46 is selected for low refractive index layer. Our simulation results lead to optimum parameters as: Germanium layer with 196nm thickness and Silicon Dioxide layer with 451nm thickness. Simulation of proposed filter indicated that the transfer coefficient is more than 90% in desired spectrum. Filter structure can be used on Infrared detectors to improve their resolutions and detection.

Sign in / Sign up

Export Citation Format

Share Document