The effect of dynamic etching on surface quality and laser damage resistance for fused silica optics

2017 ◽  
Author(s):  
Zhiqiang Wang ◽  
Hongwei Yan ◽  
Xiaodong Yuan ◽  
Yuan Li ◽  
Ke Yang ◽  
...  
Keyword(s):  
Surface Quality ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance

scholarly journals Effects of deep wet etching in HF/HNO_3 and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm

2017 ◽  
Vol 25 (5) ◽  
pp. 4607 ◽  
Author(s):  
Mathilde Pfiffer ◽  
Philippe Cormont ◽  
Evelyne Fargin ◽  
Bruno Bousquet ◽  
Marc Dussauze ◽  
...  
Keyword(s):  
Surface Quality ◽  
Fused Silica ◽  
Wet Etching ◽  
Laser Damage ◽  
Damage Resistance

Effects of Wet Chemical Etching on Scratch Morphology and Laser Damage Resistance of Fused Silica

Silicon ◽  
2019 ◽  
Vol 12 (2) ◽  
pp. 425-432 ◽  
Author(s):  
Hui Ye ◽  
Yaguo Li ◽  
Qiao Xu ◽  
Wei Yang ◽  
Chen Jiang
Keyword(s):  
Chemical Etching ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance ◽  
Wet Chemical ◽  
Wet Chemical Etching

scholarly journals Argon plasma etching of fused silica substrates for manufacturing high laser damage resistance optical interference coatings

2017 ◽  
Vol 7 (10) ◽  
pp. 3598 ◽  
Author(s):  
Kęstutis Juškevičius ◽  
Rytis Buzelis ◽  
Giedrius Abromavičius ◽  
Romanas Samuilovas ◽  
Saulė Abbas ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Argon Plasma ◽  
Fused Silica ◽  
Laser Damage ◽  
Optical Interference ◽  
Damage Resistance ◽  
High Laser ◽  
Silica Substrates

scholarly journals The influence of CO2 laser local irradiation on the laser damage resistance of fused silica

2013 ◽  
Vol 62 (9) ◽  
pp. 094701
Author(s):  
Liu Chun-Ming ◽  
Yang Liang ◽  
Yan Zhong-Hua ◽  
Jiang Yong ◽  
Wang Hai-Jun ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Fused Silica ◽  
Laser Damage ◽  
Local Irradiation ◽  
Damage Resistance

scholarly journals Laser field manipulation and laser damage resistance property of nanotextures on fused silica optics

2020 ◽  
Vol 18 ◽  
pp. 103262
Author(s):  
Xin Ye ◽  
Xiheng Hu ◽  
Feng Tang ◽  
Jingjun Wu ◽  
Liming Yang ◽  
...  
Keyword(s):  
Laser Field ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance ◽  
Resistance Property ◽  
Field Manipulation

scholarly journals Detection of the damage threshold of fused silica components and morphologies of repaired damage sites based on the beam deflection method

Open Physics ◽  
2018 ◽  
Vol 16 (1) ◽  
pp. 539-543
Author(s):  
Jiangmei Zhang ◽  
Xiang Gao ◽  
Kunpeng Wang ◽  
Youyong Liu ◽  
Xiuhong Yang ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Repair Process ◽  
Fused Silica ◽  
Beam Deflection ◽  
Laser Damage Threshold ◽  
Laser Damage ◽  
Online Assessment ◽  
Damage Resistance ◽  
Damage Repair

Abstract This article proposes a method to quickly detect the damage threshold of the fused silica components and the characteristics of the repair point damage. With a device detecting the beam deflection, the laser damage threshold is detected, quickly and effectively. Then, based on the beam deflection though mitigated sites, the beam deflection signals of the damage repair points are measured and the morphologies of mitigated sites are analyzed. This method is helpful in the online assessment of the damage resistance of the downstream optics and provides the guidance of the repair process.

scholarly journals HF-Based Etching Processes for Improving Laser Damage Resistance of Fused Silica Optical Surfaces

2010 ◽  
Vol 94 (2) ◽  
pp. 416-428 ◽  
Author(s):  
Tayyab I. Suratwala ◽  
Phil E. Miller ◽  
Jeffery D. Bude ◽  
William A. Steele ◽  
Nan Shen ◽  
...  
Keyword(s):  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance ◽  
Optical Surfaces

scholarly journals Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Micromachines ◽  
2021 ◽  
Vol 12 (10) ◽  
pp. 1226
Author(s):  
Wanli Zhang ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
Yongxiang Shen
Keyword(s):  
Chemical Etching ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Laser Damage ◽  
Damage Resistance ◽  
Etching Depth ◽  
Treatment Processes ◽  
Laser Induced Damage ◽  
Combined Technique

The enhancement of laser damage resistance of fused silica optics was a hotspot in scientific research. At present, a variety of modern processes have been produced to improve the laser induced damage threshold (LIDT) of fused silica optics. They included pre-treatment processes represented by flexible computer controlled optical surfacing (CCOS), magnetorheological finishing (MRF), ion beam finishing (IBF), and post-treatment processes represented by dynamic chemical etching (DCE). These have achieved remarkable results. However, there are still some problems that need to be solved urgently, such as excessive material removal, surface accuracy fluctuation in the DCE process, and the pollution in MRF process, etc. In view of above problems, an MRF, CCOS, IBF and shallow DCE combined technique was used to process fused silica optics. The surface morphology could be greatly controlled and chemical etching depth was reduced, while the LIDT increased steadily. After processing by this combined technique, the LIDT increased to 12.1 J/cm2 and the laser damage resistance properties of fused silica were significantly enhanced. In general, the MRF, IBF, CCOS and shallow DCE combined technique brought much help to the enhancement of laser damage resistance of fused silica, and could be used as a process route in the manufacturing process of fused silica.

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