Effects of substrate temperature on properties of vanadium oxide thin films on Si substrate

2017 ◽  
Author(s):  
Dianxin Hou ◽  
Yuan Lu ◽  
Fuyin Song
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Vanadium Oxide ◽  
Si Substrate ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

Electrochromic properties of vanadium oxide thin films prepared by PSPT: Effect of substrate temperature

2013 ◽  
Author(s):  
C. E. Patil ◽  
P. R. Jadhav ◽  
N. L. Tarwal ◽  
H. P. Deshmukh ◽  
M. M. Karanjakar ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Vanadium Oxide ◽  
Oxide Thin Films ◽  
Electrochromic Properties ◽  
Vanadium Oxide Thin Films

Nano-Polycrystalline Vanadium Oxide Thin Films Prepared by Pulsed Laser Deposition

2008 ◽  
Vol 8 (5) ◽  
pp. 2604-2608 ◽  
Author(s):  
Y. L. Wang ◽  
M. C. Li ◽  
X. K. Chen ◽  
G. Wu ◽  
J. P. Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Substrate Temperature ◽  
Vanadium Oxide ◽  
Pulsed Laser Deposition ◽  
Oxygen Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

Nano-polycrystalline vanadium oxide thin films have been successfully produced by pulsed laser deposition on Si(100) substrates using a pure vanadium target in an oxygen atmosphere. The vanadium oxide thin film is amorphous when deposited at relatively low substrate temperature (500 °C) and enhancing substrate temperature (600–800 °C) appears to be efficient in crystallizing VOx thin films. Nano-polycrystalline V3O7 thin film has been achieved when deposited at oxygen pressure of 8 Pa and substrate temperature of 600 °C. Nano-polycrystalline VO2 thin films with a preferred (011) orientation have been obtained when deposited at oxygen pressure of 0.8 Pa and substrate temperatures of 600–800 °C. The vanadium oxide thin films deposited at high oxygen pressure (8 Pa) reveal a mix-valence of V5+ and V4+, while the VOx thin films deposited at low oxygen pressure (0.8 Pa) display a valence of V4+. The nano-polycrystalline vanadium oxide thin films prepared by pulsed laser deposition have smooth surface with high qualities of mean crystallite size ranging from 30 to 230 nm and Ra ranging from 1.5 to 22.2 nm. Relative low substrate temperature and oxygen pressure are benifit to aquire nano-polycrystalline VOx thin films with small grain size and low surface roughness.

CHARACTERIZATION AND ELECTROCHROMIC PROPERTIES OF VANADIUM OXIDE THIN FILMS PREPARED VIA SPRAY PYROLYSIS

2013 ◽  
Vol 27 (21) ◽  
pp. 1350152 ◽  
Author(s):  
M. MOUSAVI ◽  
A. KOMPANY ◽  
N. SHAHTAHMASEBI ◽  
M.-M. BAGHERI-MOHAGHEGHI
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Vanadium Oxide ◽  
Spray Pyrolysis ◽  
Cyclic Voltammogram ◽  
Oxide Thin Films ◽  
Electrochromic Properties ◽  
Spray Rate ◽  
Vanadium Oxide Thin Films ◽  
Deposited Films

Vanadium oxide thin films were grown on glass substrates using spray pyrolysis technique. The effects of substrate temperature, vanadium concentration in the initial solution and the solution spray rate on the nanostructural and the electrochromic properties of deposited films are investigated. Characterization and the electrochromic measurements were carried out using X-ray diffraction, scanning electron microscopy and cyclic voltammogram. XRD patterns showed that the prepared films have polycrystalline structure and are mostly mixed phases of orthorhombic α- V 2 O 5 along with minor β- V 2 O 5 and V 4 O 9 tetragonal structures. The preferred orientation of the deposited films was found to be along [101] plane. The cyclic voltammogram results obtained for different samples showed that only the films with 0.2 M solution concentration, 5 ml/min solution spray rate and 450°C substrate temperature exhibit two-step electrochromic properties. The results show a correlation between cycle voltammogram, morphology and resistance of the films.

Low temperature charge carrier hopping transport mechanism in vanadium oxide thin films grown using pulsed dc sputtering

2009 ◽  
Vol 94 (22) ◽  
pp. 222110 ◽  
Author(s):  
S. S. N. Bharadwaja ◽  
C. Venkatasubramanian ◽  
N. Fieldhouse ◽  
S. Ashok ◽  
M. W. Horn ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Charge Carrier ◽  
Vanadium Oxide ◽  
Transport Mechanism ◽  
Oxide Thin Films ◽  
Hopping Transport ◽  
Dc Sputtering ◽  
Pulsed Dc ◽  
Vanadium Oxide Thin Films

Electron stimulated desorption of vanadyl-groups from vanadium oxide thin films on Ru(0001) probed with STM

2021 ◽  
Vol 23 (14) ◽  
pp. 8439-8445
Author(s):  
Ying Wang ◽  
Piotr Igor Wemhoff ◽  
Mikołaj Lewandowski ◽  
Niklas Nilius
Keyword(s):  
Thin Films ◽  
Vanadium Oxide ◽  
Electron Injection ◽  
Underlying Mechanism ◽  
Desorption Rate ◽  
Oxide Thin Films ◽  
Current Dependence ◽  
Electron Stimulated Desorption ◽  
Vanadium Oxide Thin Films

Electron injection from an STM tip has been used to desorb individual vanadyl groups from vanadium oxide thin films. The underlying mechanism is analyzed from the bias and current dependence of the desorption rate.

Sign in / Sign up

Export Citation Format

Share Document