Scatterometry-based process control for nanoimprint lithography

2016 ◽  
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Masafumi Asano ◽  
Hirotaka Tsuda ◽  
Motofumi Komori ◽  
Kazuto Matsuki ◽  
Hideaki Abe ◽  
...  
Keyword(s):  
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A novel loading and demoulding process control in UV nanoimprint lithography

2009 ◽  
Vol 86 (1) ◽  
pp. 4-9 ◽  
Author(s):  
Hongzhong Liu ◽  
Weitao Jiang ◽  
Yucheng Ding ◽  
Yiping Tang ◽  
Bingheng Lu ◽  
...  
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Process Control ◽  
Nanoimprint Lithography

Process control technology for nanoimprint lithography

2018 ◽  
Author(s):  
Hirotaka Tsuda ◽  
Hirokazu Washida ◽  
Motofumi Komori ◽  
Takuya Kono ◽  
Tetsuro Nakasugi ◽  
...  
Keyword(s):  
Process Control ◽  
Nanoimprint Lithography ◽  
Control Technology

INSTRUMENTATION - Mass Spectrometry Process Control

1956 ◽  
Vol 48 (2) ◽  
pp. 81-84
Author(s):  
William Priestley ◽  
B. Dudenbostel, Jr.
Keyword(s):  
Mass Spectrometry ◽  
Process Control

FTIR based process control for industrial reactors

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-995-Pr8-1002 ◽  
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V. Hopfe ◽  
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