Nanofabrication of ultra-low reflectivity black silicon surfaces and devices (Presentation Recording)

2015 ◽  
Author(s):  
Victor E. White ◽  
Karl Y. Yee ◽  
Kunjithapatham Balasubramanian ◽  
Pierre M. Echternach ◽  
Richard E. Muller ◽  
...  
Keyword(s):  
Silicon Surfaces ◽  
Black Silicon

scholarly journals Subtle Variations in Surface Properties of Black Silicon Surfaces Influence the Degree of Bactericidal Efficiency

2018 ◽  
Vol 10 (2) ◽  
Author(s):  
Chris M. Bhadra ◽  
Marco Werner ◽  
Vladimir A. Baulin ◽  
Vi Khanh Truong ◽  
Mohammad Al Kobaisi ◽  
...  
Keyword(s):  
Surface Properties ◽  
Silicon Surfaces ◽  
Black Silicon ◽  
Bactericidal Efficiency

One‐step Fabrication of Nanoporous Black Silicon Surfaces for Solar Cells using Modified Etching Solution

2013 ◽  
Vol 26 (1) ◽  
pp. 102-108 ◽  
Author(s):  
Ye‐hua Tang ◽  
Chun‐lan Zhou ◽  
Su Zhou ◽  
Yan Zhao ◽  
Wen‐jing Wang ◽  
...  
Keyword(s):  
Solar Cells ◽  
Silicon Surfaces ◽  
Black Silicon ◽  
Etching Solution ◽  
One Step

Influence of nanoscale topology on bactericidal efficiency of black silicon surfaces

2017 ◽  
Vol 28 (24) ◽  
pp. 245301 ◽  
Author(s):  
Denver P Linklater ◽  
Huu Khuong Duy Nguyen ◽  
Chris M Bhadra ◽  
Saulius Juodkazis ◽  
Elena P Ivanova
Keyword(s):  
Silicon Surfaces ◽  
Black Silicon ◽  
Bactericidal Efficiency

scholarly journals Influence of structure geometry on THz emission from Black Silicon surfaces fabricated by reactive ion etching

2017 ◽  
Vol 25 (6) ◽  
pp. 6604 ◽  
Author(s):  
Ulrike Blumröder ◽  
Matthias Zilk ◽  
Hannes Hempel ◽  
Patrick Hoyer ◽  
Thomas Pertsch ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Silicon Surfaces ◽  
Black Silicon ◽  
Ion Etching ◽  
Structure Geometry

scholarly journals Influence of Nanoscaled Surface Modification on the Reaction of Al/Ni Multilayers

2017 ◽  
Author(s):  
Heike Bartsch ◽  
José Manuel Mánuel ◽  
Rolf Grieseler
Keyword(s):  
Surface Modification ◽  
Silicon Surface ◽  
Thermal Contact ◽  
Surface Modifications ◽  
Parent Material ◽  
Silicon Surfaces ◽  
Black Silicon ◽  
Nanostructured Surface ◽  
Full Transformation ◽  
Reference Samples

Sputtered reactive multilayers applied as a heat source in electronic joining processes are an emerging technology. Their use promises low-stress assembly of components while improving the thermal contact and reducing the thermal resistance. Nanostructured surface modifications can significantly enhance adhesion and reliability of joints between different materials. This work examines reactive multilayer of nickel and aluminum, directly sputtered on nanostructured black silicon surfaces and compares their phase transformation with reference samples deposited on pristine silicon surface. The investigation of the quenched self-propagating reaction reveals a clear influence of the nanostructured surface on the prolongation of the phase transition. Rapid thermal annealing tests result in the formation of Al1.1Ni0.9 phase. The nanostructured interface seems to hinder the full transformation of the parent material. The surface modification improves the adhesion of the formed alloy on silicon surfaces and can possibly increase the reliability of joints based on reactive aluminum/nickel multilayer. The use of black silicon, a nanostructured surface modification, is thus a promising approach to realize reliable multi-material joints in complex systems.

scholarly journals Black silicon quality control by conditions of nickel-assisted etching of crystalline silicon surfaces in photovoltaic devices

2020 ◽  
Vol 60 (1) ◽  
Author(s):  
Mindaugas Kamarauskas ◽  
Marius Treideris ◽  
Vladimir Agafonov ◽  
Audružis Mironas ◽  
Viktorija Strazdienė ◽  
...  
Keyword(s):  
Silicon Surface ◽  
Crystalline Silicon ◽  
Electrochemical Etching ◽  
Photovoltaic Cell ◽  
Silicon Surfaces ◽  
Metal Catalyst ◽  
Black Silicon ◽  
Silicon Substrates ◽  
Photovoltaic Devices ◽  
Thin Nickel

Here we present a study of the nickel-assisted etching applied to form uniform black silicon layers on crystalline silicon substrates. We related the parameters used for technological process control (etchant, nickel thickness) to parameters of the obtained surface and explain the correlation using the etching model responsible for etching of the silicon covered by a thin nickel film. The increase in the thickness of the metal catalyst did not suppress the etching completely but allowed one to tune the roughness of the silicon surface. The rate of the electrochemical etching was additionally changed by adaptation of the proportion of components in the complex etchant. Depending on the intentionally selected conditions, the duration of the optimized process was from 3 to 10 min. The lowest optical reflection commonly accepted as the black silicon surface was obtained for the mixture with a low amount of the active etchant component. It was demonstrated that the method is acceptable to improve the characteristics of a photovoltaic cell.

Adsorption of Human Plasma Albumin and Fibronectin onto Nanostructured Black Silicon Surfaces

Langmuir ◽  
2016 ◽  
Vol 32 (41) ◽  
pp. 10744-10751 ◽  
Author(s):  
Duy H. K. Nguyen ◽  
Vy T. H. Pham ◽  
Mohammad Al Kobaisi ◽  
Chris Bhadra ◽  
Anna Orlowska ◽  
...  
Keyword(s):  
Human Plasma ◽  
Silicon Surfaces ◽  
Black Silicon ◽  
Plasma Albumin
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