13nm EUV free electron lasers for next generation photolithography: the critical importance of RF stability

2015 ◽  
Author(s):  
Simon Keens ◽  
Bodo Fritsche ◽  
Carmen Hiltbrunner ◽  
Marcel Frei
Keyword(s):  
Free Electron ◽  
Free Electron Lasers ◽  
Next Generation ◽  
Critical Importance

scholarly journals A mechanism of Cu work function reduction in CsBr/Cu photocathodes

2016 ◽  
Vol 18 (10) ◽  
pp. 7427-7434
Author(s):  
M. T. E. Halliday ◽  
W. P. Hess ◽  
A. L. Shluger
Keyword(s):  
Thin Films ◽  
Work Function ◽  
Free Electron ◽  
Particle Accelerators ◽  
Free Electron Lasers ◽  
Next Generation

Thin films of CsBr deposited on Cu(100) have been proposed as next-generation photocathode materials for applications in particle accelerators and free-electron lasers.

scholarly journals High-sensitivity x-ray/optical cross-correlator for next generation free-electron lasers

2020 ◽  
Vol 28 (16) ◽  
pp. 23545
Author(s):  
Stefan Droste ◽  
Sioan Zohar ◽  
Lingjia Shen ◽  
Vaughn E. White ◽  
Elizabeth Diaz-Jacobo ◽  
...  
Keyword(s):  
Free Electron ◽  
High Sensitivity ◽  
Free Electron Lasers ◽  
Next Generation ◽  
X Ray

High-sensitivity X-ray Optical Cross-Correlator for Next Generation Free-Electron Lasers

2019 ◽  
Author(s):  
Stefan Droste ◽  
Lingjia Shen ◽  
Vaughn E. White ◽  
Elizabeth Diaz-Jacobo ◽  
Ryan Coffee ◽  
...  
Keyword(s):  
Free Electron ◽  
High Sensitivity ◽  
Free Electron Lasers ◽  
Next Generation ◽  
X Ray

scholarly journals Development and Technical Challenges of Next Generation Free Electron Lasers

2011 ◽  
Vol 58 (16) ◽  
pp. 1349-1350 ◽  
Author(s):  
John N. Corlett ◽  
Michael W. Poole ◽  
Richard P. Walker
Keyword(s):  
Free Electron ◽  
Free Electron Lasers ◽  
Next Generation ◽  
Technical Challenges
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