Model for spin waves and lasing in monolayer graphene films

2015 ◽  
Author(s):  
Vladimir L. Derbov ◽  
Dmitry D. Grachev ◽  
Leonid A. Sevastyanov ◽  
Konstantin P. Lovetskiy ◽  
Sergey I. Vinitsky ◽  
...  
Keyword(s):  
Spin Waves ◽  
Monolayer Graphene ◽  
Graphene Films

scholarly journals Контролируемый синтез графена на меди с использованием метода имплантации атомов отдачи углерода

2019 ◽  
Vol 45 (4) ◽  
pp. 49
Author(s):  
А.Ф. Вяткин
Keyword(s):  
Cooling Rate ◽  
Copper Foil ◽  
Annealing Temperature ◽  
Monolayer Graphene ◽  
Graphene Synthesis ◽  
Graphene Films ◽  
Recoil Atoms

AbstractA method of graphene synthesis on the surface of copper foil by cold implantation of carbon recoil atoms is considered. It is established that monolayer graphene films are formed on the surface of carbon-implanted copper foil under certain conditions (annealing temperature and duration, cooling rate) of postimplantation processing.

Monolayer graphene films through nickel catalyzed transformation of fullerol and graphene quantum dots: a Raman spectroscopy study

2014 ◽  
Vol T162 ◽  
pp. 014030 ◽  
Author(s):  
J R Prekodravac ◽  
S P Jovanović ◽  
I D Holclajtner-Antunović ◽  
D B Peruško ◽  
V B Pavlović ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Raman Spectroscopy ◽  
Graphene Quantum Dots ◽  
Monolayer Graphene ◽  
Spectroscopy Study ◽  
Graphene Films

scholarly journals Realization of Large-Area Wrinkle-Free Monolayer Graphene Films Transferred to Functional Substrates

2015 ◽  
Vol 5 (1) ◽  
Author(s):  
Byeong-Ju Park ◽  
Jin-Seok Choi ◽  
Hyun-Suk Kim ◽  
Hyun-You Kim ◽  
Jong-Ryul Jeong ◽  
...  
Keyword(s):  
Monolayer Graphene ◽  
Large Area ◽  
Graphene Films

Water-assisted rapid growth of monolayer graphene films on SiO2/Si substrates

Carbon ◽  
2019 ◽  
Vol 148 ◽  
pp. 241-248 ◽  
Author(s):  
Shijing Wei ◽  
Lai-Peng Ma ◽  
Mao-Lin Chen ◽  
Zhibo Liu ◽  
Wei Ma ◽  
...  
Keyword(s):  
Rapid Growth ◽  
Monolayer Graphene ◽  
Si Substrates ◽  
Graphene Films

scholarly journals Criteria for the growth of large-area adlayer-free monolayer graphene films by chemical vapor deposition

2019 ◽  
Vol 5 (3) ◽  
pp. 463-470 ◽  
Author(s):  
Changqing Shen ◽  
Xingzhou Yan ◽  
Fangzhu Qing ◽  
Xiaobin Niu ◽  
Richard Stehle ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Monolayer Graphene ◽  
Large Area ◽  
Graphene Films

Graphene Directly Growth on Non-Metal Substrate from Amorphous Carbon Nano Films Without Transfer and Its Application in Photodetector

2021 ◽  
Vol 13 (4) ◽  
pp. 574-582
Author(s):  
Kun Xu ◽  
Pei Ding ◽  
Yan Li ◽  
Leiming Chen ◽  
Junwei Xu ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Graphene Film ◽  
Copper Film ◽  
Chemical Vapor ◽  
Metal Substrate ◽  
Protective Atmosphere ◽  
Process Window ◽  
Monolayer Graphene ◽  
Graphene Films

A layer of nano amorphous carbon was fabricated on the target substrate by precisely controlled magnetron sputtering, and then a layer of copper film was fabricated on the amorphous carbon. By using a vertical cold wall chemical vapor deposition system under protective atmosphere, the carbon atoms at high temperature was catalyzed by copper to form graphene films. The amorphous carbon nano thin film was converted into monolayer graphene on a SiO2 substrate directly. The experimental results show that the graphene film has high crystal quality and conductivity. Compared with other methods, the process is simple and the process window is wider. By virtue of this technique, a graphene-Si photodetector was also demonstrated. The photoelectric response and frequency characteristics have been studied which shows good device characteristics.

Incorporation-limiting mechanisms during nitrogenation of monolayer graphene films in nitrogen flowing afterglows

Nanoscale ◽  
2021 ◽  
Vol 13 (5) ◽  
pp. 2891-2901
Author(s):  
G. Robert Bigras ◽  
R. Martel ◽  
L. Stafford
Keyword(s):  
Monolayer Graphene ◽  
Flowing Afterglow ◽  
Graphene Films ◽  
Defect Sites ◽  
Adsorption Of Nitrogen

Modification of graphene films in the flowing afterglow of microwave N2 plasmas. Nitrogenation is first limited by the formation of defect sites by plasma-generated N and N2(A) at low damage and then by the adsorption of nitrogen atoms at high damage.

Growth of PtRu Clusters on Ru(0001)-Supported Monolayer Graphene Films

ChemPhysChem ◽  
2012 ◽  
Vol 13 (14) ◽  
pp. 3313-3319 ◽  
Author(s):  
Albert K. Engstfeld ◽  
Stephan Beckord ◽  
Christoph D. Lorenz ◽  
R. Jürgen Behm
Keyword(s):  
Monolayer Graphene ◽  
Graphene Films
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