Photomask fabrication of focusing diffractive optical elements using electron-beam lithography

1995 ◽  
Author(s):  
Sergey V. Babin ◽  
Victor A. Danilov
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Diffractive Optical Elements ◽  
Optical Elements

scholarly journals Nanooptical elements for visual verification

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Alexander Goncharsky ◽  
Anton Goncharsky ◽  
Dmitry Melnik ◽  
Svyatoslav Durlevich
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Mass Production ◽  
Optical Element ◽  
Visual Image ◽  
Zero Order ◽  
Diffractive Optical Elements ◽  
Optical Elements ◽  
Standard Equipment ◽  
Diffractive Element

AbstractThis paper focuses on the development of flat diffractive optical elements (DOEs) for protecting banknotes, documents, plastic cards, and securities against counterfeiting. A DOE is a flat diffractive element whose microrelief, when illuminated by white light, forms a visual image consisting of several symbols (digits or letters), which move across the optical element when tilted. The images formed by these elements are asymmetric with respect to the zero order. To form these images, the microrelief of a DOE must itself be asymmetric. The microrelief has a depth of ~ 0.3 microns and is shaped with an accuracy of ~ 10–15 nm using electron-beam lithography. The DOEs developed in this work are securely protected against counterfeiting and can be replicated hundreds of millions of times using standard equipment meant for the mass production of relief holograms.

scholarly journals On a problem of the synthesis of binary nano-optical elements

2016 ◽  
pp. 415-424
Author(s):  
А.А. Гончарский ◽  
С.Ю. Серёжников
Keyword(s):  
Electron Beam ◽  
Augmented Reality ◽  
Electron Beam Lithography ◽  
Optical Element ◽  
Diffractive Optical Elements ◽  
Partial Loss ◽  
Optical Elements ◽  
Optical Images ◽  
Augmented Reality Technology ◽  
Security Label

В рамках широко распространенной технологии Augmented Reality обсуждается возможность контроля подлинности защитных оптических меток на основе бинарных нанооптических элементов. С помощью смартфона фотографируют изображение защитной метки. Полученное изображение интерпретируется как дифракционный оптический элемент. В приближении Френеля рассчитывают изображение, формируемое дифракционным оптическим элементом, которое используют для идентификации подлинности защитной метки. Защитная метка представляет собой фазовый оптический элемент, глубина микрорельефа которого не превышает 0.5 мкм. Нанооптические элементы изготавливаются с помощью электроннолучевой литографии. Разработанные нанооптические элементы устойчивы к частичному повреждению микрорельефа и могут быть использованы для идентификации банкнот, документов и др. This paper deals with optical security label identification technology as a part of augmented reality technology. Security labels are based on binary nanooptical elements and are photographed using a smartphone. Photographed images are interpreted as diffractive optical elements. Optical images formed by these diffractive elements are computed using the Fresnel approximation. These images are used to identify the security labels. A security label consists of a phase optical element whose microrelief height is of no more than 0.5 $\mu$m. Nanooptical elements are manufactured using electron-beam lithography. The optical security labels are resistant against microrelief damages and can withstand partial loss of an image. The optical elements developed can be used to protect and identify banknotes, documents, etc.

Fabrication of semi-continuous profile Diffractive Optical Elements for beam shaping by Electron Beam Lithography

2000 ◽  
Vol 53 (1-4) ◽  
pp. 325-328 ◽  
Author(s):  
A. Nottola ◽  
A. Gerardino ◽  
M. Gentili ◽  
E. Di Fabrizio ◽  
S. Cabrini ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Beam Shaping ◽  
Diffractive Optical Elements ◽  
Optical Elements
Sign in / Sign up

Export Citation Format

Share Document