Phase-enhanced defect sensitivity for EUV mask inspection

The study of relationship between defect sensitivity and inspectability on EUV masks with 19x nm mask inspection

Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2537430 ◽

2019 ◽

Author(s):

Masashi Yonetani ◽

Karen D. Badger ◽

Jed Rankin ◽

Shinji Akima ◽

Yusuke Toda ◽

...

Keyword(s):

Defect Sensitivity ◽

Mask Inspection

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Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

Uspekhi Fizicheskih Nauk ◽

10.3367/ufnr.2018.06.038447 ◽

2018 ◽

Vol 189 (03) ◽

pp. 323-334 ◽

Cited By ~ 1

Author(s):

D.B. Abramenko ◽

P.S. Antsiferov ◽

D.I. Astakhov ◽

Aleksandr Yu. Vinokhodov ◽

Il'ya Yu. Vichev ◽

...

Keyword(s):

Ultraviolet Radiation ◽

Extreme Ultraviolet ◽

Mask Inspection ◽

Extreme Ultraviolet Radiation

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Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

10.1117/12.814466 ◽

2009 ◽

Cited By ~ 1

Author(s):

Ryoichi Hirano ◽

Masatoshi Hirono ◽

Riki Ogawa ◽

Nobutaka Kikuiri ◽

Kenichi Takahara ◽

...

Keyword(s):

Super Resolution ◽

Next Generation ◽

Resolution Method ◽

Mask Inspection ◽

Mask Fabrication

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Design-Aware Mask Inspection

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems ◽

10.1109/tcad.2011.2181909 ◽

2012 ◽

Vol 31 (5) ◽

pp. 690-702 ◽

Cited By ~ 3

Author(s):

Abde Ali Kagalwalla ◽

Puneet Gupta ◽

Christopher J. Progler ◽

Steve McDonald

Keyword(s):

Mask Inspection

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Microwave discharge plasma production with resonant cavity for EUV mask inspection tool

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.126701 ◽

2015 ◽

Vol 54 (12) ◽

pp. 126701

Author(s):

Saya Tashima ◽

Masami Ohnishi ◽

Waheed Hugrass ◽

Keita Sugimoto ◽

Masatugu Sakaguchi ◽

...

Keyword(s):

Discharge Plasma ◽

Microwave Discharge ◽

Resonant Cavity ◽

Plasma Production ◽

Mask Inspection

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Hybrid active focusing with adaptive dispersion for higher defect sensitivity in guided wave inspection of cylindrical structures

Nondestructive Testing And Evaluation ◽

10.1080/10589759.2015.1093628 ◽

2015 ◽

Vol 31 (3) ◽

pp. 219-234 ◽

Cited By ~ 12

Author(s):

P. S. Lowe ◽

R. Sanderson ◽

N. V. Boulgouris ◽

T. H. Gan

Keyword(s):

Guided Wave ◽

Cylindrical Structures ◽

Defect Sensitivity

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Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Extreme Ultraviolet (EUV) Lithography XII ◽

10.1117/12.2588788 ◽

2021 ◽

Author(s):

Safak Sayan ◽

Kishore K. Chakravorty ◽

Yusuke Teramoto ◽

Takahiro Shirai ◽

Shunichi Morimoto ◽

...

Keyword(s):

Mask Inspection

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Development of element technologies for EUVL

Advanced Optical Technologies ◽

10.1515/aot-2015-0027 ◽

2015 ◽

Vol 4 (4) ◽

Author(s):

Hiroo Kinoshita ◽

Takeo Watanabe ◽

Tetsuo Harada

Keyword(s):

Extreme Ultraviolet ◽

Random Access ◽

High Volume ◽

Development Stage ◽

Extreme Ultraviolet Lithography ◽

Applied Physics ◽

Reflectivity Measurement ◽

Ultraviolet Lithography ◽

Mask Inspection ◽

The University

AbstractThirty years have passed since the first report on extreme ultraviolet lithography (EUVL) was presented at the annual meeting of the Japanese Society of Applied Physics in 1986. This technology is now in the manufacturing development stage. The high-volume manufacturing of dynamic-random-access-memory (DRAM) chips with a line width of 15 nm is expected in 2016. However, there are critical development issues that remain: generating a stand-alone EUV source with a higher power and producing a mask inspection tool for obtaining zero-defect masks. The Center for EUVL at the University of Hyogo was established in 2010. At present, it utilizes various types of equipment, such as an EUV mask defect inspection tool, an interference-lithography system, a device for measuring the thickness of carbon contamination film deposited by resist outgassing, and reflectivity measurement systems.

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