Lithography focus/exposure control and corrections to improve CDU

2013 ◽  
Author(s):  
Young Ki Kim ◽  
Mark Yelverton ◽  
Joungchel Lee ◽  
Jerry Cheng ◽  
Hong Wei ◽  
...  
Keyword(s):  
Exposure Control

scholarly journals COVID-19: a review of current knowledge regarding exposure, quarantine, isolation and other preventive measures

2021 ◽  
Vol 8 ◽  
pp. 204993612110320
Author(s):  
Robert Rosolanka ◽  
Andres F. Henao-Martinez ◽  
Larissa Pisney ◽  
Carlos Franco-Paredes ◽  
Martin Krsak
Keyword(s):  
Immune Response ◽  
Severe Acute Respiratory Syndrome ◽  
Clinical Response ◽  
Preventive Measures ◽  
Current Knowledge ◽  
Therapeutic Options ◽  
Exposure Control ◽  
Knowledge Gaps ◽  
Vaccination Strategies ◽  
Speed Up

Deeper understanding of the spread, morbidity, fatality, and development of immune response associated with coronavirus disease 2019 (COVID-19), caused by severe acute respiratory syndrome coronavirus 2, is necessary in order to establish an appropriate epidemiological and clinical response. Exposure control represents a key part of the combat against COVID-19, as the effectiveness of current therapeutic options remains partial. Since the preventive measures have not been sufficiently able to slow down this pandemic, in this article we explore some of the pertinent knowledge gaps, while overall looking to effective vaccination strategies as a way out. Early on, such strategies may need to rely on counting the convalescents as protected in order to speed up the immunization of the whole population.

Compact high-performance MWIR camera with exposure control and 12-bit video processor

1998 ◽  
Author(s):  
Thomas S. Villani ◽  
Kenneth A. Loesser ◽  
Steve N. Perna ◽  
D. R. McCarthy ◽  
Francis P. Pantuso
Keyword(s):  
High Performance ◽  
Exposure Control ◽  
Video Processor

A Case Study: SystemC-Based Design of an Industrial Exposure Control Unit

2006 ◽  
pp. 119-132 ◽  
Author(s):  
Axel G. Braun ◽  
Thorsten Schubert ◽  
Martin Stark ◽  
Karsten Haug ◽  
Joachim Gerlach ◽  
...  
Keyword(s):  
Control Unit ◽  
Exposure Control

Quality and exposure control in semiconductor manufacturing. Part II: Evaluation

2012 ◽  
Vol 50 (23) ◽  
pp. 6852-6869 ◽  
Author(s):  
Belgacem Bettayeb ◽  
Samuel Bassetto ◽  
Philippe Vialletelle ◽  
Michel Tollenaere
Keyword(s):  
Semiconductor Manufacturing ◽  
Exposure Control
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