Improvement of laser dicing system performance I: high-speed, high-quality processing of thick silicon wafers using spatial light modulator

2013 ◽  
Author(s):  
Naoya Matsumoto ◽  
Yu Takiguchi ◽  
Haruyasu Itoh ◽  
Masaharu Hoshikawa ◽  
Hiroyuki Iwaki ◽  
...  
Keyword(s):  
System Performance ◽  
High Speed ◽  
Spatial Light Modulator ◽  
Silicon Wafers ◽  
Light Modulator ◽  
High Quality

Prediction of Surface Roughness in Compressed Air Jet Assisted High Speed End Milling of Silicon Using Diamond Coated Tools

2012 ◽  
Vol 576 ◽  
pp. 41-45
Author(s):  
A.K.M. Nurul Amin ◽  
M.A. Mahmud ◽  
M.D. Arif
Keyword(s):  
Mathematical Model ◽  
Surface Roughness ◽  
Surface Finish ◽  
High Speed ◽  
End Milling ◽  
Silicon Wafers ◽  
Compressed Air ◽  
Machining Parameters ◽  
High Quality ◽  
Ductile Mode

The majority of semiconductor devices are made up of silicon wafers. Manufacturing of high-quality silicon wafers includes numerous machining processes, including end milling. In order to end mill silicon to a nano-meteric surface finish, it is crucial to determine the effect of machining parameters, which influence the machining transition from brittle to ductile mode. Thus, this paper presents a novel experimental technique to study the effects of machining parameters in high speed end milling of silicon. The application of compressed air, in order to blow away the chips formed, is also investigated. The machining parameters’ ranges which facilitate the transition from brittle to ductile mode cutting as well as enable the attainment of high quality surface finish and integrity are identified. Mathematical model of the response parameter, the average surface roughness (Ra) is subsequently developed using RSM in terms of the machining parameters. The model was determined, by Analysis of Variance (ANOVA), to have a confidence level of 95%. The experimental results show that the developed mathematical model can effectively describe the performance indicators within the controlled limits of the factors that are being considered.

High-speed programmable lithium niobate thin film spatial light modulator

2021 ◽  
Vol 46 (5) ◽  
pp. 1037
Author(s):  
Xuanchao Ye ◽  
Fengchao Ni ◽  
Honggen Li ◽  
Haigang Liu ◽  
Yuanlin Zheng ◽  
...  
Keyword(s):  
Thin Film ◽  
Lithium Niobate ◽  
High Speed ◽  
Spatial Light Modulator ◽  
Light Modulator

High‐speed binary optically addressed spatial light modulator

1989 ◽  
Vol 55 (6) ◽  
pp. 537-539 ◽  
Author(s):  
G. Moddel ◽  
K. M. Johnson ◽  
W. Li ◽  
R. A. Rice ◽  
L. A. Pagano‐Stauffer ◽  
...  
Keyword(s):  
High Speed ◽  
Spatial Light Modulator ◽  
Light Modulator

Development of (Pb,La)(Zr,Ti)O3Electro-Optic Thin Film for High-Speed Spatial Light Modulator

2006 ◽  
Vol 45 (9B) ◽  
pp. 7520-7524 ◽  
Author(s):  
Tsuyoshi Fujii ◽  
Tatsuya Suzuki ◽  
Yoshikazu Fujimori ◽  
Takashi Nakamura ◽  
Masato Moriwake ◽  
...  
Keyword(s):  
Thin Film ◽  
High Speed ◽  
Spatial Light Modulator ◽  
Light Modulator

Generation of High Quality Helical Beams Based on Spatial Light Modulator

2016 ◽  
Vol 43 (9) ◽  
pp. 0905004
Author(s):  
戴茂春 Dai Maochun ◽  
樊代和 Fan Daihe ◽  
王尧 Wang Yao ◽  
韦联福 Wei Lianfu
Keyword(s):  
Spatial Light Modulator ◽  
Light Modulator ◽  
High Quality
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