Influence of defect shape on laser-induced damage in multilayer coatings

Defect geometries and laser-induced damage in multilayer coatings

10.1117/12.185777 ◽

1994 ◽

Cited By ~ 1

Author(s):

Robert J. Tench ◽

Mark R. Kozlowski ◽

Robert Chow

Keyword(s):

Multilayer Coatings ◽

Laser Induced Damage

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Laser-induced damage of nodular defects in dielectric multilayer coatings

Optical Engineering ◽

10.1117/1.oe.57.12.121909 ◽

2018 ◽

Vol 57 (12) ◽

pp. 1 ◽

Cited By ~ 3

Author(s):

Jinlong Zhang ◽

Hongfei Jiao ◽

Bin Ma ◽

Zhanshan Wang ◽

Xinbin Cheng

Keyword(s):

Multilayer Coatings ◽

Laser Induced Damage ◽

Dielectric Multilayer

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Laser induced damage of multilayer coatings for 248 nm

The Review of Laser Engineering ◽

10.2184/lsj.36.1299 ◽

2008 ◽

Vol 36 (APLS) ◽

pp. 1299-1302

Author(s):

Hongji QI ◽

Kui YI ◽

Jingmei YUAN ◽

Hua YU ◽

Jianda SHAO ◽

...

Keyword(s):

Multilayer Coatings ◽

Laser Induced Damage

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Critical issues on the assessment of laser-induced damage thresholds of fluoride multilayer coatings at 193 nm

10.1117/12.379309 ◽

2000 ◽

Cited By ~ 2

Author(s):

Roland Thielsch ◽

Joerg Heber ◽

Norbert Kaiser ◽

Sven Martin ◽

Eberhard Welsch

Keyword(s):

Multilayer Coatings ◽

Critical Issues ◽

Laser Induced Damage ◽

193 Nm

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Laser-induced damage of nodular defects in dielectric multilayer coatings

CLEO: 2015 ◽

10.1364/cleo_at.2015.af2e.2 ◽

2015 ◽

Author(s):

Zhanshan Wang ◽

Xinbin Cheng ◽

Jinlong Zhang ◽

Tao Ding ◽

Hongfei Jiao ◽

...

Keyword(s):

Multilayer Coatings ◽

Laser Induced Damage ◽

Dielectric Multilayer

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A novel laser shock post-processing technique on the laser-induced damage resistance of 1ω HfO2/SiO2 multilayer coatings

High Power Laser Science and Engineering ◽

10.1017/hpl.2021.4 ◽

2021 ◽

Vol 9 ◽

Author(s):

Tangyang Pu ◽

Wenwen Liu ◽

Yueliang Wang ◽

Xiaoming Pan ◽

Leiqing Chen ◽

...

Keyword(s):

Damage Threshold ◽

Processing Parameters ◽

Processing Technique ◽

Plasma Pressure ◽

Multilayer Coatings ◽

Laser Shock ◽

Post Processing ◽

Laser Shock Processing ◽

Damage Resistance ◽

Laser Induced Damage

Abstract The laser shock processing implemented by a laser-induced high-pressure plasma which propagates into the sample as a shockwave is innovatively applied as a post-processing technique on HfO2/SiO2 multilayer coatings for the first time. The pure mechanical post-processing has provided evidence of a considerable promotion effect of the laser-induced damage threshold, which increased by a factor of about 4.6 with appropriate processing parameters. The promotion mechanism is confirmed to be the comprehensive modification of the intrinsic defects and the mechanical properties, which made the applicability of this novel post-processing technique on various types of coatings possible. Based on experiments, an interaction equation for the plasma pressure is established, which clarifies the existence of the critical pressure and provides a theoretical basis for selecting optimal processing parameters. In addition to the further clarification of the underlying damage mechanism, the laser shock post-processing provides a promising technique to realize the comprehensive and effective improvement of the laser-induced damage resistance of coatings.

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UHV-TEM studies of laser-induced damage

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100087471 ◽

1991 ◽

Vol 49 ◽

pp. 632-633

Author(s):

T.S. Savage ◽

R. Ai ◽

D. Dunn ◽

L.D. Marks

Keyword(s):

Surface Science ◽

Rapid Heating ◽

Local Heating ◽

Routine Practice ◽

Transmission Electron ◽

Northwestern University ◽

Laser Induced Damage ◽

Set Up ◽

Focusing Lens ◽

Diffusion Of Impurities

The use of lasers for surface annealing, heating and/or damage has become a routine practice in the study of materials. Lasers have been closely looked at as an annealing technique for silicon and other semiconductors. They allow for local heating from a beam which can be focused and tuned to different wavelengths for specific tasks. Pulsed dye lasers allow for short, quick bursts which can allow the sample to be rapidly heated and quenched. This short, rapid heating period may be important for cases where diffusion of impurities or dopants may not be desirable.At Northwestern University, a Candela SLL - 250 pulsed dye laser, with a maximum power of 1 Joule/pulse over 350 - 400 nanoseconds, has been set up in conjunction with a Hitachi UHV-H9000 transmission electron microscope. The laser beam is introduced into the surface science chamber through a series of mirrors, a focusing lens and a six inch quartz window.

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