Optimization of the optical phase shift in attenuated phase-shifting masks and application to quarter-micrometer deep-UV lithography for logics

1994 ◽  
Author(s):  
Kurt G. Ronse ◽  
Rainer Pforr ◽  
Ki-Ho Baik ◽  
Rik M. Jonckheere ◽  
Luc Van den Hove
Keyword(s):  
Phase Shift ◽  
Phase Shifting ◽  
Optical Phase ◽  
Uv Lithography ◽  
Deep Uv

Phase-shifting mask and top imaging resist for sub-half micron deep-UV lithography

1992 ◽  
Vol 17 (1-4) ◽  
pp. 75-78 ◽  
Author(s):  
O. Joubert ◽  
B. Dal'zotto ◽  
B. Picard ◽  
A. Sahm ◽  
S. Tedesco
Keyword(s):  
Phase Shifting ◽  
Uv Lithography ◽  
Deep Uv

scholarly journals Large plasmonic color metasurfaces fabricated by super resolution deep UV lithography

2021 ◽  
Vol 3 (8) ◽  
pp. 2236-2244
Author(s):  
Matthias Keil ◽  
Alexandre Emmanuel Wetzel ◽  
Kaiyu Wu ◽  
Elena Khomtchenko ◽  
Jitka Urbankova ◽  
...  
Keyword(s):  
Super Resolution ◽  
Large Area ◽  
Uv Lithography ◽  
Deep Uv

A novel super resolution deep UV lithography method is employed to fabricate large area plasmonic metasurfaces.

Sub-quarter micron phase shifting lithography using the desire process at 248 nm (deep UV)

1992 ◽  
Vol 17 (1-4) ◽  
pp. 69-73 ◽  
Author(s):  
K. Ronse ◽  
R. Jonckheere ◽  
A.M. Goethals ◽  
K.H. Baik ◽  
L. Van den hove
Keyword(s):  
Phase Shifting ◽  
Deep Uv

scholarly journals 193-nm deep-UV lithography system using a line-narrowed ArF excimer laser

1993 ◽  
Author(s):  
Bruce W. Smith ◽  
Malcolm C. Gower ◽  
Mark Westcott ◽  
Lynn F. Fuller
Keyword(s):  
Excimer Laser ◽  
Uv Lithography ◽  
Arf Excimer Laser ◽  
Deep Uv ◽  
193 Nm ◽  
Lithography System

scholarly journals Dual-band fiber-chip grating coupler in a 300 mm silicon-on-insulator platform and 193-nm deep-UV lithography

2020 ◽  
Author(s):  
David Gonzalez-Andrade ◽  
Diego Pérez Galacho ◽  
Miguel Montesinos Ballester ◽  
Xavier LE ROUX ◽  
Eric Cassan ◽  
...  
Keyword(s):  
Silicon On Insulator ◽  
Dual Band ◽  
Grating Coupler ◽  
Uv Lithography ◽  
Deep Uv ◽  
193 Nm
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