Film life enhancement of chemically amplified electron-beam resists

1993 ◽  
Author(s):  
Theodore H. Fedynyshyn ◽  
Michael F. Cronin ◽  
James W. Thackeray
Keyword(s):  
Electron Beam ◽  
Chemically Amplified ◽  
Life Enhancement

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

1991 ◽  
Author(s):  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Janet M. Kometani ◽  
James E. Hanson ◽  
Omkaram Nalamasu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Component ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material

2008 ◽  
Vol 18 (30) ◽  
pp. 3588 ◽  
Author(s):  
Hiroto Kudo ◽  
Daisuke Watanabe ◽  
Tadatomi Nishikubo ◽  
Ken Maruyama ◽  
Daisuke Shimizu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Cyclic Oligomer ◽  
Chemically Amplified ◽  
Water Wheel

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

2012 ◽  
Author(s):  
Jun-ichi Kon ◽  
Takashi Maruyama ◽  
Yoshinori Kojima ◽  
Yasushi Takahashi ◽  
Shinji Sugatani ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Volume ◽  
Direct Writing ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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