Resolution enhancement optimization methods in optical lithography with improved manufacturability

2011 ◽  
Vol 10 (2) ◽  
pp. 023009 ◽  
Author(s):  
Xu Ma
Keyword(s):  
Resolution Enhancement ◽  
Optimization Methods ◽  
Optical Lithography

Vectorial mask optimization methods for robust optical lithography

2012 ◽  
Vol 11 (4) ◽  
pp. 043008 ◽  
Author(s):  
Xu Ma ◽  
Yanqiu Li ◽  
Xuejia Guo ◽  
Lisong Dong ◽  
Gonzalo R. Arce
Keyword(s):  
Optimization Methods ◽  
Optical Lithography

Limitation of optical lithography for various resolution enhancement technologies

2002 ◽  
Author(s):  
Tae-Seung Eom ◽  
Chang-Nam Ahn ◽  
Dong-Heok Park ◽  
Cha-Won Koh ◽  
Cheol-Kyu Bok
Keyword(s):  
Resolution Enhancement ◽  
Optical Lithography ◽  
Enhancement Technologies

Lithographic Materials Technologies: 193 nm Imaging and Beyond

1999 ◽  
Vol 584 ◽  
Author(s):  
Elsa Reichmanis ◽  
Omkaram Nalamasu ◽  
Francis M. Houlihan ◽  
Allen H. Gabor ◽  
Mark O. Neisser ◽  
...  
Keyword(s):  
Resolution Enhancement ◽  
Electronics Industry ◽  
Optical Lithography ◽  
Design Rule ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
193 Nm ◽  
Productivity Gains

AbstractAdvances in microlithographic resist materials have been a key enabler of the unabated productivity gains in the electronics industry and are continuing to help push the ultimate limits of optical lithography. The challenges posed by the introduction of new optical lithography technologies that use smaller wavelengths have been successfully met by the materials community through the design of chemically amplified resist technologies and 193 nm resist materials based on aliphatic polymers and dissolution inhibitors. With continued advances in resist materials, exposure systems and resolution enhancement and mask technologies, optical lithography will be capable of patterning ≤ 0.1 μm design rule devices in future fabs.

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