High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope–based contours in next-generation lithography

2011 ◽  
Vol 10 (1) ◽  
pp. 013012 ◽  
Author(s):  
Hiroyuki Shindo
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Critical Dimension ◽  
High Accuracy ◽  
Next Generation ◽  
Optical Proximity Correction ◽  
Next Generation Lithography ◽  
Scanning Electron

Golden Wafer Study and Application for Critical Dimension Scanning Electron Microscope Stability Control

2013 ◽  
Vol 52 (1) ◽  
pp. 881-887
Author(s):  
Y. Huang ◽  
B.-X. Cai ◽  
X.-Y. Meng ◽  
W.-H. Li ◽  
Y.-S. Lin ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Critical Dimension ◽  
Stability Control ◽  
Scanning Electron
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