Influence of shadow mask design and deposition methods on nonplanar dielectric material deposition

2005 ◽  
Vol 4 (2) ◽  
pp. 023015 ◽  
Author(s):  
Andrew M. Sarangan
1996 ◽  
Vol 143 (9) ◽  
pp. 2990-2995 ◽  
Author(s):  
Jung‐Hyung Kim ◽  
Sang‐Hun Seo ◽  
Seok‐Min Yun ◽  
Hong‐Young Chang ◽  
Kwang‐Man Lee ◽  
...  

2021 ◽  
Vol 52 (1) ◽  
pp. 135-138
Author(s):  
Heemin Park ◽  
Seungyong Song ◽  
Duckjung Lee ◽  
Jungsun Park ◽  
Yeongje Park ◽  
...  

1971 ◽  
Vol 18 (9) ◽  
pp. 697-702 ◽  
Author(s):  
Y. Naruse ◽  
K. Utsunomiya ◽  
Y. Fuse

Coatings ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 140
Author(s):  
Gang Wang ◽  
Yunli Bai ◽  
Jing Zhao ◽  
Li Wang ◽  
Jiyou Zhang ◽  
...  

Improving the spatial resolution of remote sensing satellites has long been a challenge in the field of optical designing. Although the use of large-aperture reflective mirrors significantly improves the resolution of optical systems, controlling the film thickness uniformity remains an issue. The planetary rotation system (PRS) has received significant attention owing to the excellent uniformity of the coating applied to the large-aperture reflective mirror. However, the development of the PRS remains hindered by a lack of research on its properties and the design method of the shadow mask. To address this, we performed a theoretical analysis of the distribution of film thickness and uniformity in the PRS, which is impacted by parameters of geometric configuration in the vacuum chamber. We present a film thickness expression based on Knudsen’s law and the geometric configuration of the vacuum chamber that incorporates an additional shading function. Moreover, the variation of uniformity in the standard and counter PRSs was elucidated by changing the location of the evaporation source. Finally, a fixed-position shadow mask, which was obtained by theoretical design, allows the nonuniformity of the concave reflective mirror (with a 700 mm aperture) to reduce from 2.43% to 0.7%, highlighting the importance of initial shape design.


Author(s):  
J. S. Wall

The forte of the Scanning transmission Electron Microscope (STEM) is high resolution imaging with high contrast on thin specimens, as demonstrated by visualization of single heavy atoms. of equal importance for biology is the efficient utilization of all available signals, permitting low dose imaging of unstained single molecules such as DNA.Our work at Brookhaven has concentrated on: 1) design and construction of instruments optimized for a narrow range of biological applications and 2) use of such instruments in a very active user/collaborator program. Therefore our program is highly interactive with a strong emphasis on producing results which are interpretable with a high level of confidence.The major challenge we face at the moment is specimen preparation. The resolution of the STEM is better than 2.5 A, but measurements of resolution vs. dose level off at a resolution of 20 A at a dose of 10 el/A2 on a well-behaved biological specimen such as TMV (tobacco mosaic virus). To track down this problem we are examining all aspects of specimen preparation: purification of biological material, deposition on the thin film substrate, washing, fast freezing and freeze drying. As we attempt to improve our equipment/technique, we use image analysis of TMV internal controls included in all STEM samples as a monitor sensitive enough to detect even a few percent improvement. For delicate specimens, carbon films can be very harsh-leading to disruption of the sample. Therefore we are developing conducting polymer films as alternative substrates, as described elsewhere in these Proceedings. For specimen preparation studies, we have identified (from our user/collaborator program ) a variety of “canary” specimens, each uniquely sensitive to one particular aspect of sample preparation, so we can attempt to separate the variables involved.


2002 ◽  
Vol 716 ◽  
Author(s):  
K.L. Ng ◽  
N. Zhan ◽  
M.C. Poon ◽  
C.W. Kok ◽  
M. Chan ◽  
...  

AbstractHfO2 as a dielectric material in MOS capacitor by direct sputtering of Hf in an O2 ambient onto a Si substrate was studied. The results showed that the interface layer formed between HfO2 and the Si substrate was affected by the RTA time in the 500°C annealing temperature. Since the interface layer is mainly composed of hafnium silicate, and has high interface trap density, the effective barrier height is therefore lowered with increased RTA time. The change in the effective barrier height will affect the FN tunneling current and the operation of the MOS devices when it is applied for nonvolatile memory devices.


2021 ◽  
Vol 33 (1) ◽  
pp. 012019
Author(s):  
Jonathan Schaible ◽  
Luis Andrea Hau ◽  
David Weber ◽  
Thomas Schopphoven ◽  
Constantin Häfner ◽  
...  

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