Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)

2021 ◽  
Vol 39 (6) ◽  
pp. 060404
Author(s):  
Kennedy P. S. Boyd ◽  
Emily A. Cook ◽  
Maria A. Paszkowiak ◽  
Erin V. Iski
2009 ◽  
Vol 603 (10-12) ◽  
pp. 1315-1327 ◽  
Author(s):  
F. Besenbacher ◽  
J.V. Lauritsen ◽  
T.R. Linderoth ◽  
E. Lægsgaard ◽  
R.T. Vang ◽  
...  

Nanoscale ◽  
2017 ◽  
Vol 9 (32) ◽  
pp. 11410-11417 ◽  
Author(s):  
D. Zhang ◽  
M. J. Quayle ◽  
G. Petersson ◽  
J. R. van Ommen ◽  
S. Folestad

Few atomic surface layers via atomic layer deposition under near ambient conditions significantly altered dissolution and dispersion of pharmaceutical particles.


2021 ◽  
Author(s):  
Jerome W. F. Innocent ◽  
Mari Napari ◽  
Andrew L. Johnson ◽  
Thom R. Harris-Lee ◽  
Miriam Regue ◽  
...  

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor.


2005 ◽  
Vol 95 (10) ◽  
Author(s):  
Oleg G. Shpyrko ◽  
Alexei Yu. Grigoriev ◽  
Reinhard Streitel ◽  
Diego Pontoni ◽  
Peter S. Pershan ◽  
...  

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